Preparation of Vanadium Oxide Thin Films under Different Annealing Conditions

Abstract

Abstract.A novel method was used to fabricate V X O Y thin films by combining magnetron sputtering and vacuum annealing processes on Al 2 O 3 ceramic substrates, which greatly improved the success rate of the experiments and reduced the experimental requirements for the instruments. The substrate was magnetron sputter coated further oxidized in a tube furnace to produce a uniform V 2 O 5 surface, then annealed at high temperatures. XRD and SEM measurements were performed on the obtained films under different annealing conditions. Characterization results of the samples indicate that the highly reproducible VO 2 thin films can be achieved by controlling the process parameters of the magnetron sputtering and vacuum annealing. The experimental results are of great guidance value in VO 2 thin film preparation.

Mechanical Properties of V-O-N Coatings Synthesized by Cathodic Arc Evaporation

“…The mixed-valence oxide V 5 O 9 belongs to the homologous series of Magnéli phases, which are metastable compounds between V 2 O 3 and VO 2 , defined by the general stoichiometric formula V n O 2n−1 , where n is from 3 to 9 [57]. In many studies, X-ray diffraction shows the amorphous nature of vanadium oxide films deposited by magnetron sputtering [40][41][42] and vacuum-arc deposition [43,44], which is due to the low temperature of the substrate and the energy of the particles forming the coating. Additional post-deposition annealing is used to form polycrystalline phases [41,44].…”

“…In many studies, X-ray diffraction shows the amorphous nature of vanadium oxide films deposited by magnetron sputtering [40][41][42] and vacuum-arc deposition [43,44], which is due to the low temperature of the substrate and the energy of the particles forming the coating. Additional post-deposition annealing is used to form polycrystalline phases [41,44]. The combination of sufficiently high values of bias voltage and substrate temperature of 150 V and 400 • C, respectively, allows us to obtain crystalline vanadium oxide-based coatings directly during deposition.…”

“…The size of the crystallites in the oxide is about 40 nm. In several studies, X-ray diffraction shows the amorphous nature of vanadium oxide films deposited by magnetron sputtering [40][41][42] and vacuum-arc deposition [43,44], which is due to the low temperature of the substrate and the energy of the particles forming the coating.…”

Annealing temperature effect on the temperature coefficient of resistance for vanadium oxide (VOx) thin films as bolometer materials

“…For example, longer annealing time can improve the formation of VO 2 phase, which has a lower oxidation state than V 2 O 5 phase, while too long annealing time can cause over-oxidation and degradation of the films. 7,8) VOx thin film process using sputtering conducts annealing for 0.5-2 h [9][10][11][12] and sol-gel process performs annealing for 2-6 h that is relatively longer. [13][14][15] Soda-lime was selected for the substrate to assist in the observation of film color changes.…”