2018
DOI: 10.3788/fgxb20183910.1431
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Preparation of ZnO Thin Film on Zein by RF Magnetron Sputtering

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“…Theoretically, higher sputtering power is expected to provide greater kinetic energy to the sputtered particles, leading to full reaction of oxygen with metal species, thus reducing the intensity of oxygen vacancies [24]. We speculate that when the bias increased to 120 V, the kinetic energy of molecules and ions from the target became so high that it may have caused the disruption of Zn-O or Mg-O bonds within the film [25], leading to a decrease in lattice oxygen and an increase in oxygen vacancies.…”
Section: Bias Effect On Growth Composition Structure and Chemical Sta...mentioning
confidence: 96%
“…Theoretically, higher sputtering power is expected to provide greater kinetic energy to the sputtered particles, leading to full reaction of oxygen with metal species, thus reducing the intensity of oxygen vacancies [24]. We speculate that when the bias increased to 120 V, the kinetic energy of molecules and ions from the target became so high that it may have caused the disruption of Zn-O or Mg-O bonds within the film [25], leading to a decrease in lattice oxygen and an increase in oxygen vacancies.…”
Section: Bias Effect On Growth Composition Structure and Chemical Sta...mentioning
confidence: 96%