Preparation of ZnO:Zr Thin Films by Sputtering Zn:Zr Targets

Abstract

Transparent conductive ZnO:Zr thin films with different thicknesses were fabricated on glass slides by DC reactive magnetron sputtering from Zn:Zr targets consisting of Zn disk and Zr metallic chips in Ar+O2mixture gas. X-ray diffraction, four-point probe measurements, UV–vis spectrophotometers and thin film thickness tester were employed to characterize the structure, electrical and optical properties of ZnO:Zr films, respectively. The experimental investigations indicate that film thickness has an important effect on the crystal structure, optical and electrical properties of the deposited films.