2003
DOI: 10.1021/om020510x
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Preparation, Structural Characterization, and Reactions of Tantalum-Alkyne Complexes TaCl3(R1C⋮CR2)L2 (L2 = DME, Bipy, and TMEDA; L = Py)

Abstract: Tantalum-alkyne complexes with the general formula TaCl3(R1C⋮CR2)(dme) (1a, R1 = R2 = Et; 1b, R1 = R2 = n-C5H11; 1c, R1 = Ph, R2 = Me; 1d, R1 = R2 = Ph; DME = 1,2-dimethoxyethane) were synthesized by treatment of the corresponding alkynes with a low-valent tantalum derived by reduction of tantalum pentachloride with zinc powder in a mixed solvent of toluene and DME. The DME ligand can be replaced by 2 equiv of pyridine to afford the corresponding dipyridine complexes TaCl3(R1C⋮CR2)(py)2 (2a, R1 = R2 = Et; 2b, … Show more

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Cited by 49 publications
(43 citation statements)
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“…In addition, the bending structure of the C 6 Et 6 ligand is ascertained by the dihedral angle (37.5°) between the C1‐C2‐C3‐C4 and C1‐C6‐C5‐C4 planes, the value of which is less acute than that of [(C 6 Et 6 )Ta(DIPP) 2 Cl] (34.4°) 11a. The bond length of C21C22 (1.391(18) Å) in 4 is typical for a dianionic η 2 ‐alkyne ligand found in mononuclear complexes, [(η 2 ‐3‐hexyne)TaCl 3 (L) 2 ] (L=py; L 2 =DME, TMEDA) 7. 12b…”
Section: Resultsmentioning
confidence: 97%
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“…In addition, the bending structure of the C 6 Et 6 ligand is ascertained by the dihedral angle (37.5°) between the C1‐C2‐C3‐C4 and C1‐C6‐C5‐C4 planes, the value of which is less acute than that of [(C 6 Et 6 )Ta(DIPP) 2 Cl] (34.4°) 11a. The bond length of C21C22 (1.391(18) Å) in 4 is typical for a dianionic η 2 ‐alkyne ligand found in mononuclear complexes, [(η 2 ‐3‐hexyne)TaCl 3 (L) 2 ] (L=py; L 2 =DME, TMEDA) 7. 12b…”
Section: Resultsmentioning
confidence: 97%
“…In contrast, fast rotation of the arene ligands on tantalum and dinuclear vanadium centers were observedf or previously reported[ ( h 6 -arene)Ta(OAr) 3 CH 3 ]. [7,12] Although the mechanism of the reaction shown in Eq. (5) is unclear,w e presumed isproportionation of chloridel igandst ake place during the formation of complex 4.…”
Section: Resultsmentioning
confidence: 99%
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