2022
DOI: 10.1007/s11664-022-09853-8
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Preventing Void Growth Between Ni3Sn4 and Solder

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Cited by 4 publications
(14 citation statements)
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“…The consistent presence of bubbles, entrapped in the solder after reflow, provides direct evidence of the previously hypothesized thermal gasification of Ni impurities, incorporated during the plating process. 10 These findings help us build a solid foundation for anticipating and justifying the presence of Ni(OH) 2 and NiOOH compounds formed and incorporated during the Ni electroplating process. Subsequently, during the reflow and annealing processes, it is plausible that these inclusions outgas and, thus, create void-nucleation centers.…”
Section: ■ Results and Discussionmentioning
confidence: 87%
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“…The consistent presence of bubbles, entrapped in the solder after reflow, provides direct evidence of the previously hypothesized thermal gasification of Ni impurities, incorporated during the plating process. 10 These findings help us build a solid foundation for anticipating and justifying the presence of Ni(OH) 2 and NiOOH compounds formed and incorporated during the Ni electroplating process. Subsequently, during the reflow and annealing processes, it is plausible that these inclusions outgas and, thus, create void-nucleation centers.…”
Section: ■ Results and Discussionmentioning
confidence: 87%
“…10 Notably, despite the extensive variations of the plating bath composition in an attempt to associate the voiding with a specific chemistry, the resultant cross-sections kept exhibiting a substantial presence of voids after accelerated aging at 200 °C for different times. 10 The cross-sections presented in Figures 3a and S1a set the starting point of directed experimental variations in the Ni deposition chemistry followed by a critical analysis of the plating environment's impact on the voiding propensity. An effort to expand this approach directed us toward a sulfamate bath, an alternative medium for Ni deposition, as demonstrated in Figures 3b and S1b.…”
Section: ■ Results and Discussionmentioning
confidence: 99%
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