Probe and Emission Spectrometry Diagnostics in Hollow Cathode Magnetron

Abstract

This paper deals with the characterization of an ionized physical vapor deposition (IPVD) by means of hollow cathode magnetron. Langmuir probe, optical emission spectroscopy measurements were used to study a mechanism for the production of excited argon and copper atoms and ions. The kinetic processes of excitation were considered and the main processes were determined using results of measurements. The pressure range is 0.5 - 10 mTorr with 1- 5 kW discharge power. Plasma parameters such as electron densities and temperatures, electron energy distribution function, plasma space and floating potentials as a function of the position, pressure and power in the growth chamber were measured. The plasma density is up to 1012 cm?3 at 20 cm from the magnetron for 10 mTorr

Investigation of carbon ionization in HiPIMS discharge with a hollow cathode magnetron

“…The work [31] considers mechanism for the production of excited atoms and ions of buffer gas and target in a high density plasma. It was shown that the ion emitted intensity J(ion) ∝ n 2 e , if main ionization occurs by an electron impact from the ion ground state and dominant loss is due to diffusion.…”