Process development and resist modification for metal trench layers from 65nm to 45nm nodes

Wu, Steven; Lee, Sho-Shen; Yu, Chun Chi; Lin, B. N.; Xu, Cheng Bai; Suzuki, Yasuhiro; Robertson, Stewart A.; Tanaka, Tsutomu; Wan, I-Yuan

doi:10.1117/12.656640

SPIE Proceedings

2006

DOI: 10.1117/12.656640

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Process development and resist modification for metal trench layers from 65nm to 45nm nodes

Steven Wu

Sho-Shen Lee

Chun Chi Yu

et al.

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Process development and resist modification for metal trench layers from 65nm to 45nm nodes

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