2014
DOI: 10.2495/hpsm140131
|View full text |Cite
|
Sign up to set email alerts
|

Process development for 3D laser lithography

Abstract: The field of micro-electro-mechanical-systems (MEMS) grew out from the integrated circuit (IC) industry. So far the main fabrication techniques used in MEMS are planar technologies, which set limitations to the sensor/actuator design. Therefore greyscale (3D) technology seems to be the method for fabrication of three-dimensional structures in a single lithography and etching step. The idea in fabricating a 3D photoresist structure is the controlled transmission of UV light intensity during the exposure process… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
1
0

Year Published

2024
2024
2024
2024

Publication Types

Select...
1
1

Relationship

0
2

Authors

Journals

citations
Cited by 2 publications
(1 citation statement)
references
References 4 publications
0
1
0
Order By: Relevance
“…The design was consisted of just 3 grayscale levels [3] .Loomis et al [25] and LeCompte et al [26] approached the linearization of the photoresist behavior against exposure dose but their approach is slightly more complicated. Kaste et al analyzed the behavior of PR and its relation to developer concentration, soft baking and development duration and energy dosage but the resulting patterned PR has high surface roughness and it was a single continuous slope [27]. Dunkel et al linearized the PR's behavior and fabricated lenses and blazed grating but their features' dimensions are far larger than the ones that exist in LWIR Fresnel lens [28].…”
Section: Introductionmentioning
confidence: 99%
“…The design was consisted of just 3 grayscale levels [3] .Loomis et al [25] and LeCompte et al [26] approached the linearization of the photoresist behavior against exposure dose but their approach is slightly more complicated. Kaste et al analyzed the behavior of PR and its relation to developer concentration, soft baking and development duration and energy dosage but the resulting patterned PR has high surface roughness and it was a single continuous slope [27]. Dunkel et al linearized the PR's behavior and fabricated lenses and blazed grating but their features' dimensions are far larger than the ones that exist in LWIR Fresnel lens [28].…”
Section: Introductionmentioning
confidence: 99%