Process Diagnostics

Bradley, James W.; Welzel, Thomas

doi:10.1007/978-3-540-76664-3_8

Cited by 6 publications

(7 citation statements)

References 101 publications

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“…ALD is a smooth chemical vapor deposition technique, expected to leave hydroxide OH groups on the surface. Conversely, PSD might induce a more homogeneous ionic surface state; O − and O 2 − could be typically introduced due to the small amount of reactive oxygen gas that is added to the neutral argon gas during sputtering [48].…”

Section: Resultsmentioning

confidence: 99%

Electrostatic force microscopy for the accurate characterization of interphases in nanocomposites

Khoury¹,

Arinero²,

Laurentie³

et al. 2018

Beilstein J. Nanotechnol.

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The unusual properties of nanocomposites are commonly explained by the structure of their interphase. Therefore, these nanoscale interphase regions need to be precisely characterized; however, the existing high resolution experimental methods have not been reliably adapted to this purpose. Electrostatic force microscopy (EFM) represents a promising technique to fulfill this objective, although no complete and accurate interphase study has been published to date and EFM signal interpretation is not straightforward. The aim of this work was to establish accurate EFM signal analysis methods to investigate interphases in nanodielectrics using three experimental protocols. Samples with well-known, controllable properties were designed and synthesized to electrostatically model nanodielectrics with the aim of “calibrating” the EFM technique for future interphase studies. EFM was demonstrated to be able to discriminate between alumina and silicon dioxide interphase layers of 50 and 100 nm thickness deposited over polystyrene spheres and different types of matrix materials. Consistent permittivity values were also deduced by comparison of experimental data and numerical simulations, as well as the interface state of silicone dioxide layers.

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Section: Resultsmentioning

confidence: 99%

Electrostatic force microscopy for the accurate characterization of interphases in nanocomposites

Khoury¹,

Arinero²,

Laurentie³

et al. 2018

Beilstein J. Nanotechnol.

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“…In the 'on' phase it is negative with a deep valley of about À900 V about 2 ms after switching before it settles at a value of about À200 V. In the 'off' phase it attains high positive values of up to þ260 V immediately after switching before, after some oscillations, it settles at about þ40 V. V Pl has been found to follow these changes in the 'off' phase but keeps close to zero in the 'on' phase. [9,15,22] Because the energy of the positive ions which are formed in the plasma bulk is determined by V Pl , the IEDFs reproduce the changes in V Pl . The peak at 7 eV (cf.…”

Section: Discussionmentioning

confidence: 99%

Ion Energy Distributions in Magnetron Sputtering of Zinc Aluminium Oxide

Welzel

Kleinhempel

Dunger

et al. 2009

Plasma Processes & Polymers

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Ion energy distributions have been measured with an energy‐dispersive mass spectrometer during magnetron sputtering of Al doped ZnO. A d.c. and a pulsed d.c. discharge have been investigated. Different positive ions from the target material have been observed with low energies in d.c. and a second energy peak of about 30 eV in pulsed d.c. with only weak additional energy due to the sputter process. Negative ions are mainly O− with energies corresponding to the target voltage of several 100 eV. They originate from the target and barely from the (O2) gas and hit the substrate opposite the race track. In pulsed d.c., due to the varying target voltage, energies of up to 500 eV have been observed. With increasing pressure, negative ions at the substrate are reduced exponentially in their density but not in their energy.

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“…The periodic interruption or reversal of the discharge voltage leads on the other hand to strong temporal changes of the plasma parameters (see e.g. [7]- [14]) which make a physical description even more difficult, and a tailoring of the deposition process for pulsed magnetron sputtering is to date practically impossible.…”

Section: Introductionmentioning

confidence: 99%

Spatial and temporal development of the plasma potential in differently configured pulsed magnetron discharges

Welzel¹,

Dunger

Liebig

et al. 2008

New J. Phys.

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T h e o p e n -a c c e s s j o u r n a l f o r p h y s i c s Abstract. Time-resolved emissive probe measurements have been performed to study the spatio-temporal development of the plasma potential in an asymmetric bipolar pulsed magnetron discharge. The influence of the substrate potential as well as of the substrate position has been investigated while the further conditions were the same. To access the entire potential range which was between −100 V and + 400 V and to obtain sufficient time-resolution of the emissive probe, different heating currents had to be used. The plasma potential has been found to be typically close to zero in the 'on' phase, about + 40 V in the stable 'off' phase and up to + 400 V at the beginning of the 'off' phase, which is in agreement with the results of other authors. However, the positive values in the 'off' phase are generally lower than those reported and stay mostly below the target potential. This is explained by macroscopic considerations of the quasineutrality of the plasma taking into account a magnetic and geometrical shielding of the target, acting as an anode in the 'off' phase, and the potential and position of the substrate holder and environment. New Journal of Physics

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Process Diagnostics

Cited by 6 publications

References 101 publications

Electrostatic force microscopy for the accurate characterization of interphases in nanocomposites

Electrostatic force microscopy for the accurate characterization of interphases in nanocomposites

Ion Energy Distributions in Magnetron Sputtering of Zinc Aluminium Oxide

Spatial and temporal development of the plasma potential in differently configured pulsed magnetron discharges

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