2013
DOI: 10.1016/j.compositesb.2013.03.031
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Process induced residual stresses and distortions in pultrusion

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Cited by 103 publications
(200 citation statements)
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“…This approximation is well justified considering the remarkable difference, for pultruded products, between in plane (cross sectional) and out of plane (product length) dimensions, being the former of few square millimeters and the latter of several meters before the cutout. As a consequence, the problem can be reduced to a two dimensional plane strain analysis, as discussed in [25]. The corresponding transient distortions and the evolution of the process induced stresses and strains are calculated considering the temperature and the cure distributions, assuming the following contributions to the incremental total strain (Δ tot ):…”
Section: Fe Modelmentioning
confidence: 99%
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“…This approximation is well justified considering the remarkable difference, for pultruded products, between in plane (cross sectional) and out of plane (product length) dimensions, being the former of few square millimeters and the latter of several meters before the cutout. As a consequence, the problem can be reduced to a two dimensional plane strain analysis, as discussed in [25]. The corresponding transient distortions and the evolution of the process induced stresses and strains are calculated considering the temperature and the cure distributions, assuming the following contributions to the incremental total strain (Δ tot ):…”
Section: Fe Modelmentioning
confidence: 99%
“…The details of the relations between the stress and strain tensors used in the present FE approach can be found in [25]. The CHILE approach [25,27] has been implemented by means of user-routines in the commercial package ABAQUS to derive the instantaneous local resin elastic modulus ( ), assuming a linear relation of the stress and strain tensors. The corresponding expression for the resin elastic modulus, assuming secondary effects of temperature as negligible, is given as follows:…”
Section: Fe Modelmentioning
confidence: 99%
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