2015
DOI: 10.1117/1.jmm.14.2.021107
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Process monitoring using automatic physical measurement based on electrical and physical variability analysis

Abstract: A fully automated silicon-based methodology for systematic analysis of electrical features is shown. The system was developed for process monitoring and electrical variability reduction. A mapping step was created by dedicated structures such as static-random-access-memory (SRAM) array or standard cell library, or by using a simple design rule checking run-set. The resulting database was then used as an input for choosing locations for critical dimension scanning electron microscope images and for specific lay… Show more

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