2018 IEEE Symposium on VLSI Technology 2018
DOI: 10.1109/vlsit.2018.8510642
|View full text |Cite
|
Sign up to set email alerts
|

Process Optimization of Perpendicular Magnetic Tunnel Junction Arrays for Last-Level Cache beyond 7 nm Node

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

2
9
0

Year Published

2019
2019
2024
2024

Publication Types

Select...
8
1

Relationship

2
7

Authors

Journals

citations
Cited by 16 publications
(11 citation statements)
references
References 0 publications
2
9
0
Order By: Relevance
“…Choice of material parameters is consistent with experimentally measured values for thin CoFeB alloys [15,16]. The FL magnet dimension assumed here is also similar to reported STTRAM devices targeted for cache replacement [14,44]. Each of these parameters is assumed to have a Gaussian distribution due to process variation.…”
Section: Features and Datasets For MLsupporting
confidence: 61%
“…Choice of material parameters is consistent with experimentally measured values for thin CoFeB alloys [15,16]. The FL magnet dimension assumed here is also similar to reported STTRAM devices targeted for cache replacement [14,44]. Each of these parameters is assumed to have a Gaussian distribution due to process variation.…”
Section: Features and Datasets For MLsupporting
confidence: 61%
“…In practice, because of the lower current swing induced by series resistances (R write and R series ), a somewhat larger TMR is necessary. The state of the art for this variety of device ranges between 130% and 200% [34], [35]. However, additional fabrication steps, such as high-temperature annealing, have been used to achieve ∼600% TMR in IMA materials [36], showing that there is a path to increasing the PMA TMR.…”
Section: (A) Energy Cost Of the 32-bit Stt-driven Dw-mtj Datapath As mentioning
confidence: 99%
“…STT-MRAM technology is considered to be the most viable solution owing to its attractive properties such as CMOS process compatibility, high operation speeds, superior endurance, and negligible leakage, thus, making it an ideal solution for low power, embedded electronics [1][2][3]. Significant resources have been invested in the past decade at major foundries and tool suppliers to optimize this technology for last-level cache (LLC) memory, microcontroller units (MCU), eFLASH, and automotive applications [2,[4][5][6][7][8][9][10][11][12]. Despite these excellent advancements, some challenges remain.…”
Section: Introductionmentioning
confidence: 99%