Process-Parameter-Dependent Structural, Electrical, and Optical Properties of Reactive Magnetron Sputtered Ag-Cu-O Films

Reddy, P. N.; Sreedhar, Adem; Reddy, M. Muralidhar; Uthanna, S.; Pierson, J.F.

doi:10.1155/2011/986021

Cited by 5 publications

(3 citation statements)

References 30 publications

(34 reference statements)

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“…The absorption peak observed at 490 cm −1 for the Ag=CuO film with a 100 nm Ag thickness was related to the infrared active Ag-O mode for the Ag 2 O phase. 29) The results of FTIR confirmed the results of XRD analysis.…”

Section: Ftir Analysissupporting

confidence: 72%

Structural, morphological, electrical, and optical properties of silver thin films of varying thickness deposited on cupric oxide

Hajakbari

Shafieinejad

2016

Jpn. J. Appl. Phys.

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Effect of substrate temperature on the structural, electrical and optical behaviour of reactively sputtered Ag-Cu-O films M Hari Prasad Reddy, P Narayana Reddy, B Sreedhar et al. Effect of Aluminum concentration on structural and optical properties of DC reactive magnetron sputtered Zinc Aluminum Oxide thin films for transparent electrode applications B Rajesh Kumar and T Subba Rao Correlation between the electrical and structural properties of aluminium-doped ZnO thin films obtained by direct current magnetron sputtering L Avril, Ph Guaino, F Maseri et al. High transmittance hetero junctions based on n-ITO/p-CuO bilayer thin films T P Jaya and P P Pradyumnan Defect analysis of sputter grown cupric oxide for optical and electronics application Goutam Kumar Dalapati, Rasanayagam Sivasayan Kajen, Saeid Masudy-Panah et al. Evaluation of the optoelectronic properties and corrosion behavior of Al2O3-doped ZnO films prepared by dc pulsed magnetron sputtering C Zubizarreta, E G Berasategui, R Bayón et al. Influence of post-deposition thermal annealing on the properties of pulsed laser deposited tungsten layers K J Lethy, R Vinod Kumar, S Potdar et al.In this investigation, silver (Ag) films of varying thickness (25-100 nm) were grown on cupric oxide (CuO) on silicon and quartz. The CuO preparation was carried out by the thermal oxidation annealing of copper (Cu) thin films deposited by DC magnetron sputtering. The physical properties of the prepared films were studied by different techniques. Rutherford backscattering spectroscopy (RBS) analysis indicated that the Ag film thickness was about 25-100 nm. X-ray diffraction (XRD) results showed that by increasing Ag thickness, the film crystallinity was improved. Also, atomic force microscopy (AFM) and scanning electron microscopy (SEM) results demonstrated that the surface morphology and the grain size were affected by the Ag film thickness. Furthermore, the electrical resistivity of films determined by four-point probe measurements versus the Ag film thickness was discussed. A reduction in the optical band gap energy of CuO is observed from 1.51 to 1.42 eV with an increase in Ag film thickness to 40 nm in Ag/CuO films.

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Section: Ftir Analysissupporting

confidence: 72%

Structural, morphological, electrical, and optical properties of silver thin films of varying thickness deposited on cupric oxide

Hajakbari

Shafieinejad

2016

Jpn. J. Appl. Phys.

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“…The Ag–C thin film was distinctly observed for all electrocatalysts at 2θ = 39.6° . During the first 15–75 min of reduction, the crystal structures of oxide species were visible, including AgO x , ,, CuO x , ,,, and Ag x Cu y O z . , The oxide formation was probably covered by Ag after 140 min of reduction, as seen by the apparent Ag plane of Ag(111), Ag(200), and Ag (220).…”

Section: Resultsmentioning

confidence: 99%

Nanocrystalline Ag–C Composites Containing a Hexagonal Diamond Structure to Inhibit Tarnishing of Sterling Silver

Hongrutai,

Nganglumpoon,

Watmanee

et al. 2023

ACS Appl. Nano Mater.

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Three-dimensional nanocrystalline Ag–C composites containing a hexagonal diamond structure were produced by electrochemical reduction of acetic acid and electrodeposition of Ag(NO3) (0.01 M) at −1.1 V vs Ag/AgCl at ambient conditions. After applying the negative potential, an ultrathin layer of Ag (<0.1 μm) was first deposited, and subsequently, competitive electrodeposition of Ag and electroreduction of acetic acid resulted in the formation of nanocrystalline Ag–C products on the electrodes. A combination of microscopic, structural, and spectroscopic characterization results reveals that the nanocrystalline Ag–C contains a hexagonal diamond structure with an average crystallite size of 26 nm. The nanodiamond phase remained unchanged throughout 15–140 min reaction time. However, increasing the reaction time, the thickness of nanocrystalline Ag–C films increased to ∼2 μm with some large polyhedra carbon structures. The nanocrystalline Ag–C composites were utilized in the casting process of sterling silver to enhance its antitarnish properties. The antitarnishing of sterling silver upon exposure to a H2S environment was significantly improved by 50% with 0.005 wt % loading of the Ag–C composite.

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“…Uthanna et al [9] have reported the eect of deposition temperature on the structural, electrical and optical properties of AgCuO * corresponding author; e-mail: eevan2003@yahoo.co.in; elam@fct.unl.pt lms RF magnetron sputtered using the Ag 70 Cu 30 target. Narayana Reddy et al [10] have studied the effect of oxygen partial pressure and substrate temperature (T s ) on the structural, electrical and optical properties of AgCuO lms deposited using Ag 80 Cu 20 target. In this investigation, thin lms of Ag 2 Cu 2 O 3 were deposited by RF magnetron sputtering of Ag 50 Cu 50 target at dierent T s and studied the eect of T s on the core level binding energies, crystal structure, surface morphology and electrical properties.…”

Section: Introductionmentioning

confidence: 99%

Substrate Temperature Influenced Structural and Electrical Behaviour of RF Magnetron Sputtered Ag₂Cu₂O₃Films

et al. 2011

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Ag2Cu2O3 lms were deposited on glass and silicon substrates by RF magnetron sputtering of metallic equimolar (Ag50Cu50) alloy target in ArO2 mixture at dierent substrate temperature (Ts) ranging between 303 and 523 K. The eect of Ts on the core level binding energies, structural and electrical properties of the lms was systematically studied. The lms deposited at room temperature were amorphous. The lms deposited at 373 K were polycrystalline and the crystallinity was increased when the Ts was increased to 423 K. The lms deposited at 423 K and subsequently annealed at 498 K exhibits single phase Ag2Cu2O3. In the case of lms deposited at higher Ts of 523 K, Ag2O was decomposed into Ag. The electrical resistivity of the lms deposited at 303 K was 1.2 × 10 −5 Ω cm, whereas the lms formed at 423 K and subsequently annealed at 498 K showed electrical resistivity of 2.2 × 10 −3 Ω cm due to improvement in the crystallinity of single phase Ag2Cu2O3.

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Process-Parameter-Dependent Structural, Electrical, and Optical Properties of Reactive Magnetron Sputtered Ag-Cu-O Films

Cited by 5 publications

References 30 publications

Structural, morphological, electrical, and optical properties of silver thin films of varying thickness deposited on cupric oxide

Structural, morphological, electrical, and optical properties of silver thin films of varying thickness deposited on cupric oxide

Nanocrystalline Ag–C Composites Containing a Hexagonal Diamond Structure to Inhibit Tarnishing of Sterling Silver

Substrate Temperature Influenced Structural and Electrical Behaviour of RF Magnetron Sputtered Ag₂Cu₂O₃Films

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Process-Parameter-Dependent Structural, Electrical, and Optical Properties of Reactive Magnetron Sputtered Ag-Cu-O Films

Cited by 5 publications

References 30 publications

Structural, morphological, electrical, and optical properties of silver thin films of varying thickness deposited on cupric oxide

Structural, morphological, electrical, and optical properties of silver thin films of varying thickness deposited on cupric oxide

Nanocrystalline Ag–C Composites Containing a Hexagonal Diamond Structure to Inhibit Tarnishing of Sterling Silver

Substrate Temperature Influenced Structural and Electrical Behaviour of RF Magnetron Sputtered Ag2Cu2O3Films

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Substrate Temperature Influenced Structural and Electrical Behaviour of RF Magnetron Sputtered Ag₂Cu₂O₃Films