Process window and mechanism of surface property enhancement of 9Cr18 steel using plasma immersion ion implantation

Zeng, Zhi; Tang, Baoyin; Chu, Paul K.; Xia, Tian; Wang, S. Y.; Wang, X. F.

doi:10.1116/1.590666

Cited by 8 publications

(2 citation statements)

References 8 publications

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“…PIII can also serve as a pretreatment step for subsequent film deposition. By implanting the proper gaseous and/or metallic elements into the materials, characteristics such as film adhesion can be enhanced and thermal stress between the deposited and bulk materials can be allayed [38][39][40][41]. However, although PIII excels in the treatment of components with a complex geometry compared to beam-line ion implantation, the dose uniformity may not be very good unless the process is optimized.…”

Section: Plasma Implantationmentioning

confidence: 99%

Plasma-surface modification of biomaterials

Chu

Chen

Wang

et al. 2002

Materials Science and Engineering: R: Reports

1,423

652

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Plasma-surface modification (PSM) is an effective and economical surface treatment technique for many materials and of growing interests in biomedical engineering. This article reviews the various common plasma techniques and experimental methods as applied to biomedical materials research, such as plasma sputtering and etching, plasma implantation, plasma deposition, plasma polymerization, laser plasma deposition, plasma spraying, and so on. The unique advantage of plasma modification is that the surface properties and biocompatibility can be enhanced selectively while the bulk attributes of the materials remain unchanged. Existing materials can, thus, be used and needs for new classes of materials may be obviated thereby shortening the time to develop novel and better biomedical devices. Recent work has spurred a number of very interesting applications in the biomedical field. This review article concentrates upon the current status of these techniques, new applications, and achievements pertaining to biomedical materials research. Examples described include hard tissue replacements, blood contacting prostheses, ophthalmic devices, and other products. #

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Section: Plasma Implantationmentioning

confidence: 99%

Plasma-surface modification of biomaterials

Chu

Chen

Wang

et al. 2002

Materials Science and Engineering: R: Reports

1,423

652

View full text Add to dashboard Cite

show abstract

“…Plasma immersion ion implantation ͑PIII͒ is a versatile materials fabrication and surface treatment technique. [1][2][3][4] Its nonline-of-sight advantage renders it an excellent technique to enhance the properties and performance of large and irregular-shaped industrial components. 1,[5][6][7] For example, it is being applied to synthesize silicon-on-insulator substrates for low-power, high-speed complementary metal-oxidesilicon microelectronics chips.…”

Section: Introductionmentioning

confidence: 99%

Direct current plasma implantation using a grounded conducting grid

Kwok

Zeng

Chan

et al. 2000

Journal of Applied Physics

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A novel plasma implantation technique performed in a low pressure steady state dc mode utilizing a grounded conducting grid on top of the wafer stage is presented. By numerically simulating the ion paths by the particle-in-cell method, it is observed that the ion paths are optimized for certain implant geometry. In the optimal configuration, the directional angle of the acceleration vector does not depend on the mass and charge state of the ions, and the ratio of the partial differential of the scalar potential along the radial and longitudinal directions remains constant for varying applied voltages. The retained dose and impact energy uniformity are totally determined by the ratio of the radius of the wafer stage r, radius of the vacuum chamber R, distance between the wafer stage and the grid H, and thickness of the wafer stage D. The optimal ratio is r:R:H:Dϭ1:4:2.5:2, that is, suggesting a disk shape vacuum chamber, which is quite different from that of a conventional plasma immersion ion implanter. In addition to retaining the large area and parallel processing advantages of plasma immersion ion implantation ͑PIII͒, the implantation energy can be extended far beyond the limit of PIII as the technique obviates the use of the power modulator, which not only limits the implantation energy but also is the most expensive and technologically complex hardware component in a PIII system.

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Plasma immersion ion implantation of industrial gears

Zeng

Xia

et al. 2004

Surface and Coatings Technology

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Process window and mechanism of surface property enhancement of 9Cr18 steel using plasma immersion ion implantation

Cited by 8 publications

References 8 publications

Plasma-surface modification of biomaterials

Plasma-surface modification of biomaterials

Direct current plasma implantation using a grounded conducting grid

Plasma immersion ion implantation of industrial gears

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