Processing of Three‐Dimensional Microstructures Using Macroporous n‐Type Silicon

Ottow, S.; Lehmann, Volker; Föll, H.

doi:10.1149/1.1836442

Cited by 124 publications

(51 citation statements)

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“…However, far from being a disadvantage, this approach can be readily used to develop some optical structures such as photonic crystals and optical waveguides in the visible and NIR range as the refractive index of MpSi can be engineered in depth along the pore yielding a waveguide structure embedded in the array of macropores [55,56]. Furthermore, this technique can be combined with lithographic patterning to produce 2D infrared photonic crystals featuring perfectly ordered and straight macropores [57][58][59][60][61][62][63][64]. In this process, arrays of macropores are coated by a lithographic mask after electrochemical etching.…”

Section: Macroporous Siliconmentioning

confidence: 99%

Electrochemical Etching Methods for Producing Porous Silicon

Santos

Kumeria

2015

Electrochemically Engineered Nanoporous Materials

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Porous silicon produced by electrochemical etching of silicon has become one of the most popular materials used in many scientific disciplines as a result of its outstanding and unique set of chemical and physical properties and cost-competitive fabrication processes. To understand the electrochemical mechanisms taking place in the course of the etching of silicon is a key factor to control and modify the structure of this versatile porous material. This makes it possible to produce a broad range of structures, which can range from a porous matrix to arrays of nanowires. These structures are unique and bring new opportunities for multiple research fields and applications such as biotechnology, medicine, optoelectronics, chemistry and so forth. This chapter is aimed at compiling and summarising the fundamental aspects behind the production of porous silicon structures by electrochemical and metal-assisted etching of silicon wafers. Our objective is to provide a simple but detailed overview about the fabrication process of porous silicon, with special emphasis on the different fabrication conditions and geometric and morphological features of the resulting silicon nanostructures.

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Section: Macroporous Siliconmentioning

confidence: 99%

Electrochemical Etching Methods for Producing Porous Silicon

Santos

Kumeria

2015

Electrochemically Engineered Nanoporous Materials

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“…a square organization of Al 2 O 3 pores [37]. The principle of controlling the formation of a nanostructure by inducing a local defect was also employed by Lehmann and coworkers for Si [38] or Schmuki et al for InP [39]. This work reviews the results obtained by the recently established novel method for the fabrication of metallic nanostructures from directionally solidified and electrochemically treated eutectics.…”

mentioning

confidence: 92%

Preparation and specific properties of single crystalline metallic nanowires

Hassel

Bello-Rodriguez

Sutherland-Smith

et al. 2010

Physica Status Solidi (b)

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Directional solidification of eutectics is a route to produce isooriented metallic single crystalline nanowires (NWs). Etching or electrochemical oxidation allows selective dissolution of either of the phases to produce NW arrays, isolated NWs, nanopore arrays and also derived structures by combining various process steps. A good understanding of the thermodynamics and the kinetics of the phase transformation and chemical reactions including electrodissolution, passivation, selective etching, complexing of reaction products and electrodeposition in the systems NiAl-X (X ¼ Re, W, Mo), Ag-Cu and Fe-Au was reached. Functional devices based on these NWs, like high aspect ratio NW based STM tips, nanoelectromechanical systems (NEMS), NW pH sensors and sensor arrays were constructed.Array of rhenium single crystalline NWs embedded in the NiAl matrix after partial dissolution of the matrix.

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“…In the latter case, the pattern is produced either by photolithography on the porous layer from the front side [11] or by local removal of the substrate [12]. In this study, we chose as the basis the variant of [12], which was updated and supplemented with a technique for defect formation.…”

Section: Design and Technologymentioning

confidence: 99%

Fabrication technology of heterojunctions in the lattice of a 2D photonic crystal based on macroporous silicon

Zharova

Astrova

et al. 2011

Semiconductors

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Abstract-Design and fabrication technology of a microcavity structure based on a double heterojunction in macroporous silicon is suggested. The fabrication process of a strip of a 2D photonic crystal constituted by a finite number of lattice periods and the technique for defect formation by local opening of macropores on the substrate side, followed by filling of these macropores with a nematic liquid crystal, are considered.

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Processing of Three‐Dimensional Microstructures Using Macroporous n‐Type Silicon

Cited by 124 publications

References 0 publications

Electrochemical Etching Methods for Producing Porous Silicon

Electrochemical Etching Methods for Producing Porous Silicon

Preparation and specific properties of single crystalline metallic nanowires

Fabrication technology of heterojunctions in the lattice of a 2D photonic crystal based on macroporous silicon

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