Processing outcomes of atomic force microscope tip-based nanomilling with different trajectories on single-crystal silicon

Wang, Jiqiang; Yan, Yongda; Geng, Yanquan; Luo, Xichun; Fan, Pengfei

doi:10.1016/j.precisioneng.2021.06.009

Cited by 20 publications

(5 citation statements)

References 43 publications

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“…Mechanical scanning probe lithography (M-SPL) prompts the selective removal of materials from the substrate surface by several nN mechanical forces applied at the probe using ploughing, milling, and cutting via atomic-force microscope (AFM) [127][128][129]. To sum up, this technique can be categorized into two work types depending on the AFM scanning mode.…”

Section: Fabrication Mechanismmentioning

confidence: 99%

“…This process is called static ploughing lithography, as shown on the left side of Figure 22. When AFM works in the tapping mode, as illustrated on the right side of Figure 22, a bigger amplitude applied on the cantilever makes the cantilever achieve its resonant Mechanical scanning probe lithography (M-SPL) prompts the selective removal of materials from the substrate surface by several nN mechanical forces applied at the probe using ploughing, milling, and cutting via atomic-force microscope (AFM) [127][128][129]. To sum up, this technique can be categorized into two work types depending on the AFM scanning mode.…”

Section: Fabrication Mechanismmentioning

confidence: 99%

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Scanning Probe Lithography: State-of-the-Art and Future Perspectives

et al. 2022

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High-throughput and high-accuracy nanofabrication methods are required for the ever-increasing demand for nanoelectronics, high-density data storage devices, nanophotonics, quantum computing, molecular circuitry, and scaffolds in bioengineering used for cell proliferation applications. The scanning probe lithography (SPL) nanofabrication technique is a critical nanofabrication method with great potential to evolve into a disruptive atomic-scale fabrication technology to meet these demands. Through this timely review, we aspire to provide an overview of the SPL fabrication mechanism and the state-the-art research in this area, and detail the applications and characteristics of this technique, including the effects of thermal aspects and chemical aspects, and the influence of electric and magnetic fields in governing the mechanics of the functionalized tip interacting with the substrate during SPL. Alongside this, the review also sheds light on comparing various fabrication capabilities, throughput, and attainable resolution. Finally, the paper alludes to the fact that a majority of the reported literature suggests that SPL has yet to achieve its full commercial potential and is currently largely a laboratory-based nanofabrication technique used for prototyping of nanostructures and nanodevices.

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Section: Fabrication Mechanismmentioning

confidence: 99%

Section: Fabrication Mechanismmentioning

confidence: 99%

Scanning Probe Lithography: State-of-the-Art and Future Perspectives

et al. 2022

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“…In recent years, AFM tip-based nano-machining has been recognized as an emerging technology for machining nanostructures, nanometer-scale 3D imaging of material properties and photomask repair [34][35][36][37][38][39] . In this contribution, we employ a commercially available probe to perform atomic force microscopy (AFM)-based nano-machining to remove surface artifacts and expose the underlying ferroelectric domain configuration of 7.9 nm (1.5 u.c.)…”

Section: Introductionmentioning

confidence: 99%

What lies beneath? Investigations of atomic force microscopy-based nano-machining to reveal sub-surface ferroelectric domain configurations in ultrathin films

Keeney,

Colfer,

Dutta

et al. 2023

Microstructures

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Multiferroic materials, encompassing simultaneous ferroelectric and ferromagnetic polarization states, are enticing multi-state materials for memory scaling beyond existing technologies. Aurivillius phase B6TFMO (Bi6TixFeyMnzO18) is a unique room temperature multiferroic material that could ideally be suited to future production of revolutionary memory devices. As miniaturization of electronic devices continues, it is crucial to characterize ferroelectric domain configurations at very small (sub-10 nm) thickness. Direct liquid injection chemical vapor deposition allows for frontier development of ultrathin films at fundamental (close to unit cell) dimensions. However, layer-by-layer growth of ultrathin complex oxides is subject to the formation of surface contaminants and 2D islands and pits, which can obscure visualization of domain patterns using piezoresponse force microscopy (PFM). Herein, we apply force from a sufficiently stiff diamond cantilever while scanning over ultrathin films to perform atomic force microscopy (AFM)-based nano-machining of the surface layers. Subsequent lateral PFM imaging of sub-surface layers uncovers 45° orientated striped twin domains, entirely distinct from the randomly configured piezoresponse observed for the pristine film surface. Furthermore, our investigations indicate that these sub-surface domain structures persist along the in-plane directions throughout the film depth down to thicknesses of less than half of an Aurivillius phase unit cell (˂ 2.5 nm). Thus, AFM-based nano-machining in conjunction with PFM allows demonstration of stable in-plane ferroelectric domains at thicknesses lower than previously determined for multiferroic B6TFMO. These findings demonstrate the technological potential of Aurivillius phase B6TFMO for future miniaturized memory storage devices. Next-generation devices based on ultrathin multiferroic tunnel junctions are projected.

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“…Conventional micromachining techniques, such as single-point diamond turning, fast tool servo machining, and ultraprecise milling, often give rise to unavoidable technical challenges, such as the occurrence of micro-cracks, fractures, and subsurface damage. [5][6][7][8] Furthermore, the controllability and stability of machining quality are also limited by severe tool wear. Gray photolithography presents another viable alternative.…”

mentioning

confidence: 99%

Laser Direct Writing for Micromachining of Freeform Surface on n-Type GaAs via Photoelectrochemical Etching

Yuan,

Yao,

Han

et al. 2024

J. Electrochem. Soc.

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The fabrication of microstructures featuring freeform surfaces on semiconductor substrates confronts substantial obstacles due to their inherent material difficulties, including considerable hardness and brittleness, as well as geometric complexity. In this investigation, we leverage laser direct writing (LDW) combined with photoelectrochemical etching to achieve precise material removal from semiconductor surfaces. By conducting a series of experiments on a home-made LDW apparatus under varying conditions, we established a correlation between the etching depth and both the power intensity and motion speed of the laser spot. The analysis revealed that the etching depth exhibited linearly with the power intensity of the laser spot and inversely with the motion speed. Additionally, the half widths of the grooves maintained consistently within the range of 1-2 μm. By leveraging this methodology, we successfully fabricated a freeform micro-optical structure on an n-GaAs wafer by precisely adjusting the power intensity of the laser spot during scanning, thus demonstrating the feasibility for achieving nanoscale machining precision. This research underscores the promise of this technique in significantly advancing the fabrication processes of semiconductor devices.

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Processing outcomes of atomic force microscope tip-based nanomilling with different trajectories on single-crystal silicon

Cited by 20 publications

References 43 publications

Scanning Probe Lithography: State-of-the-Art and Future Perspectives

Scanning Probe Lithography: State-of-the-Art and Future Perspectives

What lies beneath? Investigations of atomic force microscopy-based nano-machining to reveal sub-surface ferroelectric domain configurations in ultrathin films

Laser Direct Writing for Micromachining of Freeform Surface on n-Type GaAs via Photoelectrochemical Etching

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