Production of dispersions with small particle size from commercial indium tin oxide powder for the deposition of highly conductive and transparent films

Mahajeri, M.; Schneider, A.; Baum, M.; Rechtenwald, Thomas; Voigt, Michael; Schmidt, Michael

doi:10.1016/j.tsf.2012.03.121

Cited by 16 publications

(8 citation statements)

References 25 publications

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“…7). Similar observations have been reported for thin films prepared from dispersions of nano-sized ITO particles [31][32][33]. In these cases the long term decrease of the conductivity during storage in air for several weeks was proposed to be due to incorporation of oxygen into the lattice and re-oxidation of the films.…”

Section: Electrical Conductivitysupporting

confidence: 81%

Optimisation of chemical solution deposition of indium tin oxide thin films

2014

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An environmentally friendly aqueous sol-gel process has been optimised to deposit indium tin oxide (ITO) thin films, aiming to improve the film properties and reduce the deposition costs. It was demonstrated how parameters such as cation concentration and viscosity could be applied to modify the physical properties of the sol and thereby reduce the need for multiple coatings to yield films with sufficient conductivity. The conductivity of the thin films was enhanced by adjusting the heat treatment temperature and atmosphere. Both increasing the heat treatment temperature of the films from 530 to 800°C and annealing in reducing atmosphere significantly improved the electrical conductivity, and conductivities close to the state of the art sputtered ITO films were obtained. A pronounced decreased conductivity was observed after exposing the thin films to air and the thermal reduction and ageing of the film was studied by in situ conductivity measurements.

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Section: Electrical Conductivitysupporting

confidence: 81%

Optimisation of chemical solution deposition of indium tin oxide thin films

2014

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“…61 In addition, this laser sintering process has also been employed to fabricate transparent conducting indium tin oxide (ITO) electrodes, which are widely used in photovoltaic devices such as solar cells and touch-screen displays. 64 A dispersion of ITO nanoparticles was printed on the glass substrate by the LIFT process and then annealed at 450°C in ambient air on a hot plate. However, due to the extremely high melting temperature of the ITO particles (∼1900°C), annealing at 450°C was not enough to form a fully dense ITO film.…”

Section: Laser Sintering Of Nanocrystalline-tio 2 Electrodesmentioning

confidence: 99%

Laser materials processing for micropower source applications: a review

2014

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This paper reviews recent work on the fabrication of energy storage and power generation using laser-based processes such as pulsed laser deposition (PLD), laser-induced forward transfer (LIFT), and laser surface processing techniques. PLD is a versatile technique for depositing high-quality layers of materials for cathodes, anodes, and solid electrolytes for thin-film microbatteries. Using sequential PLD processes, solid-state thin-film lithium-ion microbatteries can be successfully fabricated. LIFT is a powerful tool for printing complex materials with highly porous structures for the fabrication of micropower sources such as thick-film batteries and metal oxide-based solar cells. In particular, using the LIFT process it is possible to print thick layers (∼100 μm) while maintaining pattern integrity and low-internal resistance. As a consequence, power sources fabricated in this manner exhibit higher energy densities per unit area than those obtained by traditional thin-film growth techniques. In addition, the printed active materials can be modified by postlaser processes, such as laser sintering and laser structuring, to further improve the device performance by enhancing the electrodes' three-dimensional networked structure and increasing the overall active surface, respectively. This review will discuss various examples where laser materials' processing has led to new approaches in the development of micropower sources applications. © The Authors. Published by SPIE under a Creative Commons Attribution 3.0 Unported License. Distribution or reproduction of this work in whole or in part requires full attribution of the original publication, including its DOI.

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“…Agglomeration of the particles was prevented by the organic agent 2-[2-(2-methoxyethoxy)ethoxy]acetic. M. Mahajeri et al (2012) in detail describes the production of the suspension.…”

Section: Ito Nanoink Preparationmentioning

confidence: 99%

The Influence of Laser Induced Consolidation on the Ablation Threshold of Nanoparticulate ITO-layers

et al. 2014

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Indium tin oxide (ITO) is one of the few materials, which combines optical transparency in the wavelength range of visible light and electrical conductivity. It offers a wide range of applications in the field of optoelectronic devices such as solar cells or displays. To the present day, ITO is commonly deposited in a vacuum environment. Deposition under vacuum atmosphere is a cost-intensive process and not compatible with modern manufacturing techniques, like roll-to-roll processing. To overcome this limitation we propose the generation of ITO layers by deposition of ITO nanoparticles under atmospheric conditions. For the generation of functional devices structured layers are required. The exact damage threshold of nanoparticulate ITO layers is essential to minimize influence of the structuring process on the substrate. In our measurements we used three different substrates, spin coated layers, annealed layers and consolidated layers.

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Production of dispersions with small particle size from commercial indium tin oxide powder for the deposition of highly conductive and transparent films

Cited by 16 publications

References 25 publications

Optimisation of chemical solution deposition of indium tin oxide thin films

Optimisation of chemical solution deposition of indium tin oxide thin films

Laser materials processing for micropower source applications: a review

The Influence of Laser Induced Consolidation on the Ablation Threshold of Nanoparticulate ITO-layers

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