2010
DOI: 10.1134/s1063784210080189
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Production of high-quality manganite-based films on an improved VUP-5M magnetron device

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Cited by 16 publications
(8 citation statements)
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“…As it is mentioned above, LSMO films were deposited on the Al 2 O 3 (012) substrates using the method of the magnetron sputtering of the ceramic target of La 0.7 Sr 0.3 MnO 3 composition [4,14]. The substrate temperature was 300 K and 970 K. The obtained films were oxygen deficient directly after deposition.…”
Section: Methodsmentioning
confidence: 99%
“…As it is mentioned above, LSMO films were deposited on the Al 2 O 3 (012) substrates using the method of the magnetron sputtering of the ceramic target of La 0.7 Sr 0.3 MnO 3 composition [4,14]. The substrate temperature was 300 K and 970 K. The obtained films were oxygen deficient directly after deposition.…”
Section: Methodsmentioning
confidence: 99%
“…The films were obtained by dc magnetron sputtering of a ceramic target onto high-quality single-crystal substrates (Mateck, Germany) with (110) orientation heated to 873 K in a gas mixture atmosphere (20% oxygen and 80% argon) [15]. The films composition was controlled using an INCA Energy-350 energy dispersive spectrometer.…”
Section: Experiments Detailsmentioning
confidence: 99%
“…Пленки, полученные описанным выше способом, характеризуются недостатком КС [25]. Последовательное насыщение материала пленок кислородом осуществлялось путем пошаговой термообработки пленочных структур на воздухе при нескольких фиксированных температурах в интервале 773−1173 K. Режим нагревания пленочной структуры до рабочей температуры и охлаждения до комнатной осуществлялся в течение получаса, со скоростью примерно 20−30 K/min.…”
Section: экспериментальные деталиunclassified