2014
DOI: 10.12693/aphyspola.125.1388
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Production of Mo+Beams Using an Arc Discharge Ion Source

Abstract: A new method of Mo+ ion beam production is presented in the paper. The method bases on the chemical sputtering/etching of the molybdenum parts (e.g. anode) of the arc discharge ion source by the chloride containing plasma. A mixture of CCl4 (or CHCl3) vapor and air was used as the feeding substance. The separated Mo + beam current of approximately 18 µA was achieved. The measurements of the ion current dependences on the discharge and lament currents as well as on the magnetic eld ux density from the electroma… Show more

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Cited by 3 publications
(5 citation statements)
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“…It should be also noted that the discharge voltage U a rises with the discharge current. This was observed for the previously reported Mo ions production method [29] and the low melting point and volatile feeding substances [27]. The most important factor could be, however, the change of ionisation efficiency with the discharge voltage, and, consequently with the mean energy of electrons in the discharge.…”
Section: Resultssupporting
confidence: 58%
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“…It should be also noted that the discharge voltage U a rises with the discharge current. This was observed for the previously reported Mo ions production method [29] and the low melting point and volatile feeding substances [27]. The most important factor could be, however, the change of ionisation efficiency with the discharge voltage, and, consequently with the mean energy of electrons in the discharge.…”
Section: Resultssupporting
confidence: 58%
“…The ion source used for refractory metals ion beam production was the arc discharge ion source witch cylindrical anode presented in [26][27][28][29]. In the considered case (283) the ion source was configured without any internal evaporator.…”
Section: Methodsmentioning
confidence: 99%
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“…The versatility of that particular kind of ion sources is due to the possibility of tailoring of the internal evaporator, namely size and placement inside the source [44]. It should be also mentioned here that ion source could be feed with chlorine and fluorine containing working gases like CCl 4 , HCCl 3 or CCl 2 F 2 which proved to work well for production of Mo + and Ta + ions [45,46] as well as rare earths' ions using their oxides [47].…”
Section: Introductionmentioning
confidence: 99%
“…The crucial point of the method is application of carbon tetrachloride (CCl 4 ) vapours as a highly reactive carrier gas. This approach has been also successfully applied for molybdenum ion beam production [17]. A very similar method has been applied in the case of microwave ion source [18] in order to produce intense Fe + beam from hematite (Fe 2 O 3 ).…”
Section: Introductionmentioning
confidence: 99%