1997
DOI: 10.1016/s0042-207x(97)00041-9
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Production of ultrahigh vacuum by helium glow discharge cleaning in an unbaked vacuum chamber

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Cited by 5 publications
(3 citation statements)
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“…To improve the surface wettability, we developed an in situ pretreatment using a GDC that was performed at a pressure of 2.8 × 10 −2 Torr for 1 h. This cleaning step dissociates water molecules, forming OH radicals and H atoms [28,29]. The OH radicals remain on the surface in a strongly bound state, and only the hydrogen molecules are desorbed to the gas phase and pumped out of the chamber.…”
Section: Nanoparticle-covered Substratesmentioning
confidence: 99%
“…To improve the surface wettability, we developed an in situ pretreatment using a GDC that was performed at a pressure of 2.8 × 10 −2 Torr for 1 h. This cleaning step dissociates water molecules, forming OH radicals and H atoms [28,29]. The OH radicals remain on the surface in a strongly bound state, and only the hydrogen molecules are desorbed to the gas phase and pumped out of the chamber.…”
Section: Nanoparticle-covered Substratesmentioning
confidence: 99%
“…Helium is chosen as the working gas since He-GDC is commonly used in tokamak devices [20,21]. Three particles, such as an electron, e, a positive ion, He + , and an excited helium atom are included.…”
Section: Governing Equations and Boundary Conditionsmentioning
confidence: 99%
“…Akaishi 1997 [9] experimentally investigated the effect of helium glow discharge cleaning as a wall conditioning technique for the production of ultrahigh vacuum in an unbaked vacuum system. A test chamber made of 304 stainless steel was constructed.…”
mentioning
confidence: 99%