2016
DOI: 10.1016/j.jcrysgro.2016.08.042
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Progress in periodically oriented III-nitride materials

Abstract: The ability to grow III-nitride structures with alternating c-plane orientation has garnered interest in using these materials for new application spaces, such as frequency conversion. An overview of recent progress in growing periodically oriented (PO) III-nitrides is discussed, including AlN, AlGaN, and GaN. Successes in fabricating thick PO GaN structures (>500mm) for uses in frequency conversion are highlighted.

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Cited by 9 publications
(11 citation statements)
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“…The fabrication of LPS depends on patterning of the underlying LT-AlN buffer deposited on sapphire. Generally, a III-nitride thin film grown on AlN buffer leads to III-polarity, while a film grown on bare sapphire with proper nitridation results in N-polarity . However, the control of the thin film quality and interface abruptness of LPS, especially high-Al-content AlGaN-based LPS, is not trivial.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…The fabrication of LPS depends on patterning of the underlying LT-AlN buffer deposited on sapphire. Generally, a III-nitride thin film grown on AlN buffer leads to III-polarity, while a film grown on bare sapphire with proper nitridation results in N-polarity . However, the control of the thin film quality and interface abruptness of LPS, especially high-Al-content AlGaN-based LPS, is not trivial.…”
Section: Resultsmentioning
confidence: 99%
“…Generally, a III-nitride thin film grown on AlN buffer leads to III-polarity, while a film grown on bare sapphire with proper nitridation results in N-polarity. 14 However, the control of the thin film quality and interface abruptness of LPS, especially high-Alcontent AlGaN-based LPS, is not trivial. Prior to hightemperature epitaxial growth, the patterned AlN buffer went through H 2 annealing followed by a nitridation process under an NH 3 atmosphere.…”
Section: Resultsmentioning
confidence: 99%
“…Polarity control can be realized by either patterning of LT buffers and subsequent nitridation [23,24], or changing the deposition temperature of AlN buffers prior to growth [25]. However, since the AlN buffer can only be deposited under one particular temperature during one growth process, the latter technique is not suitable for LPS fabrication.…”
Section: Fabrication Of Lateral Polarity Structurementioning
confidence: 99%
“…[13] A macroscale lateral polarity structure (LPS) was fabricated by substrate patterning followed by epitaxial growth through metal-organic chemical vapor deposition (MOCVD) with III-and N-polarity domains simultaneously grown side-by-side. [14] Utilizing this structure, Collazo et al reported a depletion-mode metalsemiconductor field-effect transistor (MESFET) on LPS-GaN with improvement in contact resistance. [15] Sheikhi et al reported the usage of LPS-GaN in the fabrication of Schottky barrier diode (SBD) with smaller on-state resistance and larger rectification ratio.…”
Section: Introductionmentioning
confidence: 99%
“…A few works have been carried out so far. [14,[16][17][18] A recent study of our group demonstrated that by scaling down the size of both III-and N-polar domains to only several micrometers, and incorporating LPS into AlGaN/GaN multiple quantum wells (MQWs), dramatically different optical behaviors were identified. [19] Higher luminescence intensity was observed in N-polar than in III-polar domains, which can be ascribed to thickness fluctuations in N-polar domains as previously demonstrated by transmission electron microscopy (TEM).…”
Section: Introductionmentioning
confidence: 99%