2019
DOI: 10.1117/1.jatis.5.2.021011
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Progress of coating stress compensation of silicon mirrors for Lynx x-ray telescope mission concept using thermal oxide patterning method

Abstract: A thermal oxide patterning method has proven to be effective for correcting coating-stress-induced distortion on flat silicon wafers. We report progress on developing this method for correcting curved silicon mirrors distorted by front-side iridium coatings. Owing to the difference in geometry, a finite element model has been established to calculate the appropriate duty cycle maps in thermal oxide hexagon patterns used for compensation. In addition, a photolithographic process, along with three-dimensional pr… Show more

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Cited by 12 publications
(6 citation statements)
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“…The application of C/Ni/Pt trilayer coatings in a telescope with a higher resolution will require decreasing the internal stress, what can be achieved through the use of stress relaxation methods. 33,34 Thermal stability is one of the more important parameters of a reflective coating. 35 The C/Ni/Pt trilayer sample was annealed in vacuum for 1 h at a temperature of 200°C.…”
Section: Resultsmentioning
confidence: 99%
“…The application of C/Ni/Pt trilayer coatings in a telescope with a higher resolution will require decreasing the internal stress, what can be achieved through the use of stress relaxation methods. 33,34 Thermal stability is one of the more important parameters of a reflective coating. 35 The C/Ni/Pt trilayer sample was annealed in vacuum for 1 h at a temperature of 200°C.…”
Section: Resultsmentioning
confidence: 99%
“…5 (2) maximize x-ray reflectivity. 38,39 As of February 2019, mirror segments of surface quality comparable to or better than those of the Chandra mirrors have been made repeatedly. 4,40 Each mirror segment is kinematically supported for alignment and then permanently bonded at four locations onto a silicon plate, which serves as the structural backbone of a mirror module.…”
Section: Fig 5 Chandra Wolter Type I and Lynxmentioning
confidence: 99%
“…One way of trimming the thickness of the silicon oxide layer is using chemical etching, which has been recently demonstrated 31 . Another way is using an ion beam, the same as figuring the silicon substrate.…”
Section: Mirror Coating 31mentioning
confidence: 99%