1 Introduction The M n+1 AX n phases (n = 1, 2 or 3, short MAX) are a class of ternary nanolaminates, consisting of a transition metal M, an A-group element A and either nitrogen and/or carbon as X. Due to alternating strong covalent M-X and weak metallic M-A bonds along the c-axis of their hexagonal lattice, they exhibit an unusual combination of metallic and high-performance ceramic properties, which has spawned a high scientific interest [1].Over the last years, MAX phases have also been investigated in thin film form, and their synthesis by various deposition techniques was demonstrated for several ternary carbides [2]. However for the nitrides, to date only Ti 2 AlN films were synthesized e.g. by reactive sputtering from elemental Ti and Al targets [2], where basal-plane oriented Ti 2 AlN(0001) films are usually achieved by epitaxial deposition onto lattice-matched MgO(111) or Al 2 O 3 (0001) substrates and require a minimum deposition temperature of 675 °C [2]. Depositions at lower temperatures induce a Ti 2 AlN growth with the c-axis tilted away from the substrate normal, accompanied by a polycrystalline film morphology and surface roughening [3]. Polycrystalline Ti 2 AlN does also form by solid-state reaction during annealing of AlN/Ti diffusion couples, with somewhat conflicting results depending on form of reactant, temperature and characterization