2009
DOI: 10.1149/1.3028308
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Properties of a Permeation Barrier Material Deposited from Hexamethyl Disiloxane and Oxygen

Abstract: We characterize a recently discovered material that forms an ultra-hermetic environmental barrier layer for the protection of organic light-emitting displays. The layer is deposited by plasma-enhanced chemical vapor deposition (PE-CVD) from the nontoxic precursor gases, hexamethyl disiloxane and oxygen. We measured the PE-CVD deposition rate, wet and dry etch rates, IR absorption spectrum, wetting contact angle with water, surface roughness and phase shift from atomic force microscopy, coefficient of thermal e… Show more

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Cited by 30 publications
(29 citation statements)
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“…5 This dielectric is a homogeneous material that is part-SiO 2 and part-silicone polymer. 6,7 Here we present evidence that employing the new gate dielectric also results in a-Si: H TFTs with unusually high effective electron field-effect mobility eff,e , and comparatively high hole field-effect mobility eff,h . For clarity we distinguish between the free electron ͑e͒ and free hole ͑h͒ mobilities in the bands, 0,e and 0,h , the time-of-flight ͑TOF͒ drift mobilities d,e and d,h , the intrinsic field-effect mobilities int,e and int,h , and the effective field-effect mobilities eff,e and eff,h .…”
mentioning
confidence: 77%
“…5 This dielectric is a homogeneous material that is part-SiO 2 and part-silicone polymer. 6,7 Here we present evidence that employing the new gate dielectric also results in a-Si: H TFTs with unusually high effective electron field-effect mobility eff,e , and comparatively high hole field-effect mobility eff,h . For clarity we distinguish between the free electron ͑e͒ and free hole ͑h͒ mobilities in the bands, 0,e and 0,h , the time-of-flight ͑TOF͒ drift mobilities d,e and d,h , the intrinsic field-effect mobilities int,e and int,h , and the effective field-effect mobilities eff,e and eff,h .…”
mentioning
confidence: 77%
“…Our approach is to include material strategies based on the combinations of organic and inorganic thin film multilayers. Here, we outline the adaptation to our implants of a recently developed packaging material based on a nanocomposite of PDMS and SiO 2 [7]. The thin conformal films are produced with a Plasma Enhanced Chemical Vapor Deposition (PECVD) system.…”
Section: Fabrication: Process Flowmentioning
confidence: 99%
“…This system deposits layers of material from a HMDSO and O 2 plasma mixture. The deposited materials have been reported to provide a reliable hermetic permeation barrier for highly water sensitive Organic Light Emitting Diodes (OLEDs) [7]. …”
Section: Fabrication: Process Flowmentioning
confidence: 99%
“…Silicon nitride-based barrier films have been used with success, allowing a display demonstrator with sufficiently wide bezel seal area to be bent over 100 000 repeats to a bending radius of 2 mm without failure 7 . Some of these films are difficult to implement on native polymer substrates, and investigations to create molecularly impermeable thin film barriers have been carried out with varying results [8][9][10][11][12] .…”
Section: Introductionmentioning
confidence: 99%