2016
DOI: 10.4191/kcers.2016.53.1.105
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Properties of Blocking Layer with Ag Nano Powder in a Dye Sensitized Solar Cell

Abstract: We prepared a working electrode (WE) with a blocking layer (BL) containing 0 ~0.5 wt% Ag nano powders to improve the energy conversion efficiency (ECE) of dye sensitized solar cell (DSSC). FESEM and micro-Raman were used to characterize the microstructure and phase. UV-VIS-NIR spectroscopy was employed to determine the adsorption of the WE with Ag nano powders. A solar simulator and a potentiostat were used to confirm the photovoltaic properties of the DSSC with Ag nano powders. From the results of the microst… Show more

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Cited by 7 publications
(2 citation statements)
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“…The IDEs were fabricated on a glass substrate using an ultraviolet (UV) photolithographic process. ,, A 3-μm-thick layer of a positive photoresist (AZ-GXR-601) was spin-coated onto a 4 in. glass wafer. , After soft-baking the photoresist layer at 105 °C for 1 min, UV-photolithography was performed using a photomask of the IDEs. The IDEs were designed to have 100 pairs of finger electrodes, each with a width of 5 μm (de) and a 5 μm (dgap) space between each.…”
Section: Methodsmentioning
confidence: 99%
See 1 more Smart Citation
“…The IDEs were fabricated on a glass substrate using an ultraviolet (UV) photolithographic process. ,, A 3-μm-thick layer of a positive photoresist (AZ-GXR-601) was spin-coated onto a 4 in. glass wafer. , After soft-baking the photoresist layer at 105 °C for 1 min, UV-photolithography was performed using a photomask of the IDEs. The IDEs were designed to have 100 pairs of finger electrodes, each with a width of 5 μm (de) and a 5 μm (dgap) space between each.…”
Section: Methodsmentioning
confidence: 99%
“…glass wafer. 27,28 After soft-baking the photoresist layer at 105 °C for 1 min, UV-photolithography was performed using a photomask of the IDEs. The IDEs were designed to have 100 pairs of finger electrodes, each with a width of 5 μm (de) and a 5 μm (dgap) space between each.…”
mentioning
confidence: 99%