Cd 1Ϫx Zn x Te (CZT) and cadmium telluride (CdTe) have great potential for application in high-energy X-ray and ␥-ray detectors. [1][2][3][4] However, CdTe detectors are limited to small sizes, which makes the instruments less sensitive to gamma-emitting sources. In addition, the leakage currents are too large for many X-ray applications. Although CdTe is very promising as a gamma-ray detector due to its high absorption coefficient, there are some drawbacks that limit its widespread use in these devices. It has been suggested that alloying CdTe with certain other materials to produce ternary compounds with higher bandgaps and increased energy of defect formation would lead to solid-state detectors with improved performance. 5 Cd 1Ϫx Zn x Te films with Zn composition x between 0.2 and 0.8 exhibit poor crystallinity as observed by X-ray diffraction (XRD). This effect has been attributed to phase separation resulting from the existence of a miscibility gap in the CdTe-ZnTe phase diagram. 6 Therefore, by CZT crystal growth, the content of Zn is limited to less than 10%. 7 High-quality crystals of CZT with high concentrations of Zn are difficult to achieve by the usual methods of crystal growth.We have studied a low-pressure, low-substrate-temperature metallorganic chemical vapor deposition (MOCVD) method using hydrogen radical reaction. 8,9 In this method, hydrogen radicals are introduced in the reaction region of the chemical vapor deposition (CVD) chamber in order to cause dissociation of the organic material. As alloy growth at high temperature is considered to contribute to phase separation, it is important to use a low substrate temperature. When nitrogen is introduced into the hydrogen plasma source, p-type CdZnTe films are expected as a result of nitrogen radical doping. 10 In this paper we report CdZnTe crystal growth and p-type doping characterization.Experimental Epitaxial CdZnTe films were prepared using the remote plasmaenhanced (RPE) MOCVD apparatus illustrated in Fig. 1. The apparatus was equipped with a load-lock system to avoid exposure of the reactor to air, together with a vacuum system with a turbomolecular pump. The substrates on the substrate holder were contained in a vertical type stainless steel reactor and were mounted on a resistive heater. Dimethylcadmium (DMCd) and diethylzinc (DEZn) were used as the group II source monomers, and diethyltellurium (DETe) was used as the group VI source monomer. These materials were introduced into the reactor from a bubbling cylinder kept at constant temperature and pressure. The flow rates of the gases were controlled by a mass-flow controller. Gases were introduced into the reaction region above the substrates. Hydrogen (H) radicals, generated using a radio frequency (rf, 13.56 MHz) coil mounted 30 cm away from the substrate, were introduced into the reaction chamber with the source materials. Semi-insulating GaAs(100) wafers were used as substrates. Prior to the growth process, the substrates were chemically etched in a liquid acid mixture of H 2 SO 4 , ...