1987
DOI: 10.1179/sur.1987.3.1.47
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Properties of Crn and (Ti, Al)N Coatings Produced by High Rate Sputter Deposition

Abstract: CrNand (Ti, AI) N coatings have been deposited by high rate sputter deposition. CrN is one of the most uncritical coatings to produce, neither microhardness nor sputtering stability being influenced by sputtering conditions. Depending upon the nitrogen partial pressure during deposition and the aluminium content, (Ti, AI) N coatings with maximum microhardness values of 2200-3000 HVO·Ol can be obtained. Such coatings have superior oxidation and wear resistance compared to normal sputtered TiN coatings.

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Cited by 43 publications
(5 citation statements)
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“…fcc-TM 1−x Al x N), exhibit considerable improvements of mechanical and chemical properties as compared with their binary counterparts. Here, particularly Ti 1−x Al x N and more recently Cr 1−x Al x N [1][2][3][4][5][6], which can be synthesized by physical vapour deposition in their cubic metastable state, have found widespread applications as protective coatings in advanced machining [7][8][9][10][11], as wear and corrosion resistant coatings for different tools [12][13][14][15][16], or in electronic devices [17].…”
Section: Introductionmentioning
confidence: 99%
“…fcc-TM 1−x Al x N), exhibit considerable improvements of mechanical and chemical properties as compared with their binary counterparts. Here, particularly Ti 1−x Al x N and more recently Cr 1−x Al x N [1][2][3][4][5][6], which can be synthesized by physical vapour deposition in their cubic metastable state, have found widespread applications as protective coatings in advanced machining [7][8][9][10][11], as wear and corrosion resistant coatings for different tools [12][13][14][15][16], or in electronic devices [17].…”
Section: Introductionmentioning
confidence: 99%
“…Thin films of chromium nitride have aroused technical interest recently [3]. By way of an example, thin CrN films having values of microhardness comparable to those of TiN [4] are easier to deposit by reactive magnetron sputtering, which is a common technique in thin film production: CrN is formed over a larger range of nitrogen partial pressures. This implies a significant simplification in process control [5].…”
Section: Introductionmentioning
confidence: 99%
“…To date, only a small part of the types of nanomaterials have been practically realized -nanostructured nickel foil, soft magnetic alloy "Finmet", multilayer semiconductor heterostructures, superhard nitride films, etc. (see, for example, [1][2][3][4][5][6]). These are mainly the results of the manifestation of size effects, and the ideas [7][8][9][10] are still awaiting their full practical implementation.…”
Section: Introductionmentioning
confidence: 99%