“…Additionally, Cu in its Cu 2 þ ionic state (0.072 nm) has similar ionic radius compared to Zn 2 þ (0.074 nm) and the similarities in their electronic shell structure allows Cu 2 þ ions substitution easily into the ZnO host lattice. So far, numerous attempts have been performed to fabricate the Cu-doped ZnO films for specific applications in the field of optoelectronics through various deposition techniques, such as spray pyrolysis [9,12], RF sputtering [13][14][15][16], DC sputtering [17], simultaneous RF and DC magnetron sputtering [18], low-temperature aqueous solution route [19], pulsed laser deposition [20] and co-reactive magnetron sputtering [21]. However, among these, we focused on simultaneous RF and DC magnetron sputtering technique which enables here for better adhesion, tunable dopant concentration and controllability of structural and optical properties by independently doping of dopant element into host lattice.…”