Properties of cupric oxide coatings prepared by cathodic arc deposition

Márquez, A.; Blanco, Ginesa; Rapp, Manfred; Lamas, Diego G.; Tarulla, R.

doi:10.1016/j.surfcoat.2004.02.009

Cited by 23 publications

(7 citation statements)

References 11 publications

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“…Different deposition techniques have been reported for copper oxide thin films (e.g. electrodeposition [1], sol-gel [2,3], cathodic arc deposition [4], pulsed magnetron sputtering [5], spray pyrolysis deposition (SPD) [6,7]. The SPD technique is a promising method due to its low cost and the possibility of depositing large area of thin films.…”

Section: Introductionmentioning

confidence: 99%

Surface properties of copper based cermet materials

Voinea

Vladuta

Bogatu

et al. 2008

Materials Science and Engineering: B

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Section: Introductionmentioning

confidence: 99%

Surface properties of copper based cermet materials

Voinea

Vladuta

Bogatu

et al. 2008

Materials Science and Engineering: B

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“…The cathodic arc device used for the synthesis of the films has been described in detail in a previous work [23]. The arc was run at a current of 110 A between a titanium cathode and the stainless steel vacuum chamber which acts as the anode.…”

Section: Methodsmentioning

confidence: 99%

Enhancement of rutile phase formation in TiO2 films deposited on stainless steel substrates with a vacuum arc

et al. 2017

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“…The titanium cathode (grade 2, 5.5 cm diameter) was coaxially placed on one end of the chamber. The vacuum system consisted of a diffusion pump with a rotary vane backing pump, reaching a base pressure of 0.01 Pa. A detailed description of the CAD system can be found in a previous work [38].…”

Section: Preparation Of Filmsmentioning

confidence: 99%

Efficiency of cathodic arc-grown N-doped TiO₂ films for the photocatalytic reduction of Cr(VI) under UV-Vis irradiation

Kleiman,

Meichtry,

Xaubet

et al. 2023

J. Phys. D: Appl. Phys.

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The photocatalytic activity of undoped and N-doped TiO2 anatase films with different thicknesses prepared by cathodic arc deposition (CAD) on glass substrates is reported. After TiO2 deposition, the doping of the films was carried out by plasma immersion ion implantation in a nitrogen environment. The composition of the films was studied by x-ray photoelectron spectroscopy (XPS), the surface morphology was analyzed by atomic force microscopy (AFM) and the crystalline structure was examined by x-ray diffraction (XRD). The thickness was determined by observing the film profile with scanning electron microscopy (SEM). The transmittance of the films in the UV-Vis range was studied as well. The photocatalytic activity of the films was evaluated through the efficiency in the reduction of Cr(VI) in the presence of ethylenediaminetetraacetic acid (EDTA) under UV-Vis irradiation. N-doped films presented a higher photocatalytic efficiency than undoped films: Cr(VI) reduction after 5 h irradiation augmented from 58 (pure TiO2) to 85% (N-doped TiO2) for films of 300 nm thickness, and from 69 to 85% for films with a thickness of 440 nm. On the other hand, pure TiO2 films of 790 nm thickness were more efficient (99% of Cr(VI) reduction) but the effect of doping on the photocatalytic activity was negligible.

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Properties of cupric oxide coatings prepared by cathodic arc deposition

Cited by 23 publications

References 11 publications

Surface properties of copper based cermet materials

Surface properties of copper based cermet materials

Enhancement of rutile phase formation in TiO2 films deposited on stainless steel substrates with a vacuum arc

Efficiency of cathodic arc-grown N-doped TiO₂ films for the photocatalytic reduction of Cr(VI) under UV-Vis irradiation

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Properties of cupric oxide coatings prepared by cathodic arc deposition

Cited by 23 publications

References 11 publications

Surface properties of copper based cermet materials

Surface properties of copper based cermet materials

Enhancement of rutile phase formation in TiO2 films deposited on stainless steel substrates with a vacuum arc

Efficiency of cathodic arc-grown N-doped TiO2 films for the photocatalytic reduction of Cr(VI) under UV-Vis irradiation

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Product

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Efficiency of cathodic arc-grown N-doped TiO₂ films for the photocatalytic reduction of Cr(VI) under UV-Vis irradiation