2001
DOI: 10.1016/s0013-4686(01)00546-1
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Properties of electroless and electroplated Ni–P and its application in microgalvanics

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Cited by 109 publications
(44 citation statements)
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“…Early work on melt-spun amorphous Ni-P alloys claimed them to be ''enriched in elemental phosphorus'' [10][11][12] but assigned phosphorus in the bulk alloy to ''elemental phosphorus''. This opinion was cited repeatedly until publication of the results of recent work [25,26]. On the other hand, the authors' work on amorphous Fe70Cr10P13C7 alloys has shown that phosphorus in the bulk of this alloy has a partial negative charge [23,24] in agreement with the literature data for Ni-P alloys [27,28] and on a series of binary nickel-phosphides [29].…”
Section: Introductionmentioning
confidence: 65%
“…Early work on melt-spun amorphous Ni-P alloys claimed them to be ''enriched in elemental phosphorus'' [10][11][12] but assigned phosphorus in the bulk alloy to ''elemental phosphorus''. This opinion was cited repeatedly until publication of the results of recent work [25,26]. On the other hand, the authors' work on amorphous Fe70Cr10P13C7 alloys has shown that phosphorus in the bulk of this alloy has a partial negative charge [23,24] in agreement with the literature data for Ni-P alloys [27,28] and on a series of binary nickel-phosphides [29].…”
Section: Introductionmentioning
confidence: 65%
“…Peeters and co-workers showed that the roughness between electroplated and electroless Ni-P was comparable. 18 In this study, the EP Ni-P could be deposited with a faster deposition rate than EN, and exhibited appropriate surface roughness. In fact, the surface roughness is one of the critical factors that can affect wettability between the solder paste and UBM.…”
Section: Morphology and Structure Of Ep Ni-p With Various Phosphorousmentioning
confidence: 92%
“…9) in all sizes of the pattern were the reasons for a similar hardness of NiP. Furthermore, the hardness of NiP patterns was approximately 12 GPa, which was relatively higher than the typical hardness of amorphous NiP (5-9 GPa [23][24][25] ), due to ISE as described in Fig. 7.…”
Section: Initial Deposition Of Nip At Various Pattern Sizes Ofmentioning
confidence: 63%