1993
DOI: 10.1063/1.109388
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Properties of epitaxial SrRuO3 thin films

Abstract: SrRuO3 thin films were deposited on (100) LaAlO3 using pulsed laser deposition. The films were (001) oriented normal to the substrate surface with a high degree of in-plane orientation with respect to the substrate’s major axes. An ion beam minimum yield of 2.5% was obtained for the films, indicating high crystallinity. The films exhibited metallic behavior with a room temperature resistivity of ∼200 mW cm. A kink in the resistivity, corresponding to a ferromagnetic phase transition, was observed at ∼160 K. It… Show more

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Cited by 152 publications
(73 citation statements)
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“…The Curie temperature T c = 144.9 K was evaluated from the intersection point of two fitted lines. The residual resistivity ratio RRR = 4.8, defined as the ratio between the resistivity measured at 300 K and at 0 K ( 0 is estimated from the extrapolation of the fitting for T < T c to 0 K), matches the typical values of about 5 or less reported in the literature for PLD 26,35 and MOCVD 36,37 thin films. Interestingly, the best stoichiometric films prepared by molecular beam epitaxy may exhibit RRR as high as 26 (Ref.…”
Section: Methodssupporting
confidence: 55%
“…The Curie temperature T c = 144.9 K was evaluated from the intersection point of two fitted lines. The residual resistivity ratio RRR = 4.8, defined as the ratio between the resistivity measured at 300 K and at 0 K ( 0 is estimated from the extrapolation of the fitting for T < T c to 0 K), matches the typical values of about 5 or less reported in the literature for PLD 26,35 and MOCVD 36,37 thin films. Interestingly, the best stoichiometric films prepared by molecular beam epitaxy may exhibit RRR as high as 26 (Ref.…”
Section: Methodssupporting
confidence: 55%
“…The combination of good chemical stability, good metallic conductivity [3], and easy epitaxial growth on various perovskite substrates [4][5][6] makes it attractive for possible multilayer device applications [7]. There is some evidence [8] that above ≈800K the structure reverts to cubic.…”
Section: Introductionmentioning
confidence: 99%
“…The LC-AFM scans were taken with a bias voltage varying from 0.1 to 0.95 V, with steps of 0.05 V, at the scanned area of 500ϫ 500 nm 2 . Regardless of applied bias voltage, the observed surface always consisted of areas of different conductivities.…”
Section: -2mentioning
confidence: 99%