2021
DOI: 10.1016/j.vacuum.2021.110056
|View full text |Cite
|
Sign up to set email alerts
|

Properties of ITO films deposited on paper sheets using a low-frequency (60 Hz) DC-pulsed magnetron sputtering method

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
4
1

Citation Types

0
11
0
1

Year Published

2021
2021
2024
2024

Publication Types

Select...
10

Relationship

1
9

Authors

Journals

citations
Cited by 13 publications
(12 citation statements)
references
References 14 publications
0
11
0
1
Order By: Relevance
“…There are several types of magnetron sputtering deposition techniques that can be used to deposit thin films, including direct current (DC) magnetron sputtering, radio-frequency (RF) magnetron sputtering, mid-frequency (MF) magnetron sputtering, and high-power impulse (HiPIMS) magnetron sputtering. In DC magnetron sputtering, a constant voltage is applied to the target material, which generates a stable plasma for deposition [ 47 ]. RF magnetron sputtering involves the use of a radio-frequency generator to create an oscillating electric field in the chamber, which increases the ionization of the plasma and enhances the deposition rate [ 18 , 48 ].…”
Section: Magnetron Sputtering Deposition Of Hydrophobic Thin Filmsmentioning
confidence: 99%
“…There are several types of magnetron sputtering deposition techniques that can be used to deposit thin films, including direct current (DC) magnetron sputtering, radio-frequency (RF) magnetron sputtering, mid-frequency (MF) magnetron sputtering, and high-power impulse (HiPIMS) magnetron sputtering. In DC magnetron sputtering, a constant voltage is applied to the target material, which generates a stable plasma for deposition [ 47 ]. RF magnetron sputtering involves the use of a radio-frequency generator to create an oscillating electric field in the chamber, which increases the ionization of the plasma and enhances the deposition rate [ 18 , 48 ].…”
Section: Magnetron Sputtering Deposition Of Hydrophobic Thin Filmsmentioning
confidence: 99%
“…This study investigated the antibacterial effect induced by the formation of a carbon-nitride (CN) layer on the NW-PP fabric. The CN layer was formed on the NW-PP fabrics using a modified DC-pulsed sputtering, which has been shown to minimize substrate damage [ 16 , 17 ]. The main strategy for acquiring the antibacterial effect was to use the porous structure of NW-PP fabrics and modify their surfaces to convert a C–C bond to a C–N bond.…”
Section: Introductionmentioning
confidence: 99%
“…The sensors can also detect humidity [29,30]. For these applications, the films were optimized by controlling various parameters such as the annealing temperature [31][32][33][34], substrate type [35][36][37][38], deposition method [39][40][41][42][43], and doping [44][45][46][47][48]. Regarding the deposition method, the ITO thin films were most frequently prepared using physical methods.…”
Section: Introductionmentioning
confidence: 99%