Properties of laser pulse deposited oxide films

First-principles calculations of structural and electronic properties of monoclinic hafnia surfaces

“…In addition to its potential use as a gate dielectric, HfO 2 is also used as an optical coating because of its high refractive index and high transmission coefficient. 5,6 Additionally, HfO 2 exhibits a relatively high laser damage threshold due to its high melting point, thermal and chemical stability and wide transparent range from the infrared to ultraviolet. 7,8 Furthermore, HfO 2 serves as an excellent protective coating due to its thermal stability and hardness.…”

Re-print of “Sub-eV Ion Deposition Utilizing Soft-Landing Ion Mobility for Controlled Ion, Ion Cluster, and Charged Nanoparticle Deposition”

“…In all experiments the laser was rastered along the surface of the metal target to ensure a consistent ablation event. This method is consistent with previous experimental reports for the in situ production of hafnium oxide [42][43][44]. Soft-landing was completed in a step-wise fashion over the course of 7 h, with postlanding Raman analyses being conducted at deposition intervals of 15 min for the first hour, and 1 h increments thereafter.…”

Diagnostics of nanosecond dynamics of the plasma produced during KrF excimer laser ablation of zirconia in vacuum

“…The imaging measurements of the laser ablation of YSZ in oxygen, 10 Ϫ3 and 10 Ϫ5 Torr in our experiments, show similar results on the direction of the plasma movement. Although the oblique incidence of the laser is widely used in PLA of zirconia, 5,8,13,14,17,25,27,28 this non-normal movement of the plasma center has not been mentioned before. It is worth pointing out that the direction of the plasma movement should be well considered to produce high quality films.…”