1992
DOI: 10.1007/bf01105264
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Properties of magnetron-sputtered electrically insulating Al2O3 coatings on copper

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Cited by 19 publications
(3 citation statements)
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“…[7][8][9]22 Argon content is agreed to be high when negative substrate bias is applied, but at zero bias some authors report low argon contents 7 while others find appreciable incorporation. 23 Values of elastic modulus and hardness obtained in the present study are similar to other measurements. 22 Alumina films made by other methods have different properties, for example rf magnetron-sputtered alumina films are deficient in oxygen and contain little argon, 22,23 while rf films sputtered in an argon/oxygen mixture have excess oxygen or are stoichiometric but have little argon.…”
Section: A Films On Smooth Substratessupporting
confidence: 91%
“…[7][8][9]22 Argon content is agreed to be high when negative substrate bias is applied, but at zero bias some authors report low argon contents 7 while others find appreciable incorporation. 23 Values of elastic modulus and hardness obtained in the present study are similar to other measurements. 22 Alumina films made by other methods have different properties, for example rf magnetron-sputtered alumina films are deficient in oxygen and contain little argon, 22,23 while rf films sputtered in an argon/oxygen mixture have excess oxygen or are stoichiometric but have little argon.…”
Section: A Films On Smooth Substratessupporting
confidence: 91%
“…Nanocrystalline metastable alumina phases (γ, δ, θ, κ, …) can be used as separation membranes [4,5], catalyst [6,7] or catalytic supports [8,9] because of fine particle size, high surface area and good catalytic activity. Alumina coatings (including amorphous alumina) find applications also as optical coatings [10,11] and electrically insulating layers [12,13].…”
Section: Introductionmentioning
confidence: 99%
“…1) As a technique to produce coating films, there are methods using CVD and PVD processes. [5][6][7] The CVD includes atomic layer deposition (ALD) while the PVD includes sputtering, dip-coating deposition, spray-coating, electrophoretic deposition, etc. When coating is executed by using sputtering, a high vacuum atmosphere along with a high voltage are necessary, requiring much time and high cost to obtain coating films.…”
Section: Introductionmentioning
confidence: 99%