The
semiclassical Boltzmann approach coupled with density functional
theory calculations has been used to investigate the structural, electronic,
and thermoelectric properties of Mg2Si thin films with
001, 111, and 110 orientations. The most stable slab is found to be
that with the 110 orientation. The electronic band gap vanishes for
the 001 and 111 thin films whereas for the 110 orientation the film
is semiconducting with a band gap ranging from 0.27 to 0.36 eV depending
on the number of atomic planes used to model the thin film. The energy
gap decreases when the number of planes increases. As a consequence
of the electronic band structure, the 110 semiconducting thin film
exhibits the highest thermoelectric performance, especially the Seebeck
coefficient (−350 μV K–1 at 600 K).
The lower the number of atomic planes the larger the Seebeck coefficient.
By comparing experimental data for the electrical conductivity σ
to our calculated value of σ/τ at 600 K we have determined
the electron relaxation time τ to be about 5 × 10–16 s. Using this value, and assuming a thermal conductivity of 2–3
W m–1 K–1 for the 110 Mg2Si thin film, we estimate that the figure of merit ZT at 600 K lies
in the range of 0.4–0.6.