2016
DOI: 10.1016/j.tsf.2015.09.034
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Properties of (NiO)1-(ZnO) thin films deposited by spray pyrolysis

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Cited by 10 publications
(21 citation statements)
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“…Several methods have been used for the fabrication of iron oxide thin films, including template [9], chemical vapor deposition [10], atomic layer deposition [11], hydrothermal [12], sol-gel deposition [13], magnetic sputtering [14], electrochemical anodization [15] and spray pyrolysis [2]. Among these methods, spray pyrolysis showed more advantages such as easy operation, non-toxic and eco-friendly method [16].…”
Section: Introductionmentioning
confidence: 99%
“…Several methods have been used for the fabrication of iron oxide thin films, including template [9], chemical vapor deposition [10], atomic layer deposition [11], hydrothermal [12], sol-gel deposition [13], magnetic sputtering [14], electrochemical anodization [15] and spray pyrolysis [2]. Among these methods, spray pyrolysis showed more advantages such as easy operation, non-toxic and eco-friendly method [16].…”
Section: Introductionmentioning
confidence: 99%
“…Nickel oxide NiO is one of the parts of this family of TCO, its good adsorptive properties and chemical stability; it can be deposited onto glass, ceramics, oxides, and substrate materials of other types [1,2]. The semiconductors as oxides metallic are essential compounds for the development of the ultra-high frequencies components, gas sensors, photocatalysis, optoelectronics, lithium-ion microbatteries, enamels and cathode materials for alkaline batteries [2][3][4][5]. Among these, Nickel oxide (NiO) is a semitransparent p-type semiconducting material a large gap direct (3.6-4.0 eV), and has a wide range of applications, such as gas sensors, photocatalysis, dye-sensitized, electrochromic coatings, UV photo-detector, lightweight structural components in the aerospace, in ceramic structures, a counter electrode and anode layer of solid, counter electrodes oxide fuel cells [6][7][8][9][10].…”
Section: Introductionmentioning
confidence: 99%
“…The activity "semiconductor oxides" is centered on zinc oxide (ZnO) and nickel oxide (NiO), and their alloys [1][2][3][4][5][6]. ZnO and NiO are n-type group II-VI semiconductor and p-type group VIII-VI semiconductor, respectively, although they both have wide optical gap at room temperature [2,7].…”
Section: Introductionmentioning
confidence: 99%
“…Several authors have characterized the Ni doped ZnO thin films [3,4,[8][9][10][11] and Zn doped NiO thin films [2,5,6] elaborated by several techniques such as: pulsed laser deposition [3,12], sol-gel method [4][5][6]10,11], chemical bath deposition [8], and spray pyrolysis technique [2,9]. They also studied the variation of their properties as a function of deposition conditions such as doping concentration, nature and temperature of the substrate, technique of deposition and the nature of the chemical precursor used to control, in principle, the phase deposited and its morphology.…”
Section: Introductionmentioning
confidence: 99%