Properties of Va metal-B films prepared by r.f.-sputtering

Abstract

Nbloo-xBx alloy films were prepared by the r.f.-sputtering method in the chemical composition range of 30 < x __< 76. Nblo0.xBx (30 < x < 54) films consisted of the amorphous state, and NbB2 crystal phase was observed on Nbloo.xBx (67 < x < 76) films. A remarkable preferred orientation with the (001) plane of NbBz in parallel to the film surface was observed on Nb33B87 film. d.c. electrical conductivity of Nb~00.xBx (30 __< x < 76) films decreased with increasing content of boron in the range from 7.3 • 103 to 7.6 • 102s -~ cm -1. Micro-Vickers hardness of Nb~0o.xBx (30 __< x __< 76) films exhibited the values of 1070 to 2060kg mm 2.