“…1,7 In the past decade, aluminum-doped ZnO ͑ZnO:Al, AZO͒ has attracted much interest as a potential substitute for ITO due to abundance of its constituent elements in nature, relatively low deposition temperature, and stability in hydrogen plasma. 6,7 AZO thin films have been prepared by various methods, such as magnetron sputtering, 3,8-10 pulsed laser deposition, 11,12 chemical vapor deposition, [13][14][15] sol gel, [16][17][18] and spray pyrolysis. 6,7 AZO thin films have been prepared by various methods, such as magnetron sputtering, 3,8-10 pulsed laser deposition, 11,12 chemical vapor deposition, [13][14][15] sol gel, [16][17][18] and spray pyrolysis.…”