2007
DOI: 10.1016/j.jcrysgro.2007.04.010
|View full text |Cite
|
Sign up to set email alerts
|

Prospects for the ammonothermal growth of large GaN crystal

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1

Citation Types

0
51
0
2

Year Published

2007
2007
2020
2020

Publication Types

Select...
7
1
1

Relationship

0
9

Authors

Journals

citations
Cited by 74 publications
(53 citation statements)
references
References 36 publications
0
51
0
2
Order By: Relevance
“…Fukuda and Ehrentraut [7][8][9] grew 0.5-mm-thick GaN on a 1-inch HVPE seed at growth temperature of about 500°C and pressure of less than 130 MPa. The growth rate was about 0.04 mm/day.…”
Section: Introductionmentioning
confidence: 99%
“…Fukuda and Ehrentraut [7][8][9] grew 0.5-mm-thick GaN on a 1-inch HVPE seed at growth temperature of about 500°C and pressure of less than 130 MPa. The growth rate was about 0.04 mm/day.…”
Section: Introductionmentioning
confidence: 99%
“…The authors consider two possible mechanisms of GaN growth -direct reaction of GaLi 3 N 2 with gallium and dissolution of GaLi 3 N 2 in Li-Ga melt to form ternary system -and conclude that the latter is the one that is most probable. The growth rate of GaN in the ammonothermal technique is rather small (not greater than 2µ/hour (Fukuda & Ehrebtraut, 2007)). Frequently a columnar growth occurs yielding the crystals of poor quality (Waldrip, 2007;Wang et al , 2001a).…”
Section: Ammonothermal Growth and Flux Growthmentioning
confidence: 95%
“…These properties combined with good thermal conductivity and stability which makes them as attractive materials for higher temperatures, higher power densities and higher voltages to utilize in future electrooptic systems [4].…”
Section: Introductionmentioning
confidence: 99%