We report on selective-area growth and characterization of wurtzite (WZ) InP/AlGaP core-multishell nanowires. Quantum well (QW) structures were fabricated in the AlGaP multishells by changing alloy compositions. Transmission electron microscopy revealed that the AlGaP multishell was grown with a WZ structure on side of the WZ InP core. The lattice constants of the WZ InP core and WZ AlGaP shell were determined by X-ray diffraction. Cathodoluminescence studies showed that the WZ AlGaP QW with an Al composition of 20% had green emissions at 2.37 eV. These results open the possibility for green light-emitting diodes using WZ AlGaP based materials.
2Color mixed RGB light-emitting diodes (LEDs) are promising candidates for future solidstate lightning and display technology due to their potential advantages in energy conversion efficiency and color rendering index (CRI). 1,2) However, achieving high efficient LEDs in the green region is challenging due to a lack of suitable semiconductor materials, which is known as the "green gap". 3,4) Non-nitride III-V materials having wurtzite (WZ) structures have recently offered a new approach to overcome this issue. Some theories predict that GaP and AlP in the WZ structures have direct band gaps in contrast to the conventional zinc blende (ZB) structures with indirect band gaps. [5][6][7] Although this approach has been experimentally demonstrated in WZ GaP 8,9) and WZ AlInP, 10) these WZ materials with quantum well (QW) structures required for LED applications have not been reported so far.In nanowire (NW) structures, radial core-multishell (CMS) NWs with QW structures are suitable structures for LED applications. 11,12) In this study, we report the growth and characterization of WZ InP/AlGaP CMS NWs with QW structures for the green color spectrum. The WZ AlGaP at an Al composition of around 20% is expected to have the band gap energy in the green spectral region according to calculations of their band structures. 6,7) The CMS NWs were synthesized by selective-area metal organic vapor phase epitaxy (SA-MOVPE). In SA-MOVPE, InP NWs can be grown with a pure WZ structure by properly adjusting the growth conditions. 13-15) Based on these WZ InP NWs, the crystal structure transfer method [16][17][18] was applied for the radial multishell growth. At first, a 20-nm-thick SiO 2 layer was deposited on an InP (111)A substrate using plasma sputtering, and the SiO 2 layer was partially removed using electron-beam (EB) lithography and wet chemical etching. The SiO 2 patterns were designed to be a periodic array of openings with a diameter of 130 nm.The SA-MOVPE was performed in a low-pressure MOVPE reactor using trimethylaluminum (TMAl), trimethylgallium (TMGa), trimethylindium (TMIn), and tertiarybutylphosphine 3 (TBP) as source materials. Prior to the growth, the native oxide on the openings was removed using thermal cleaning for 5 min at 600°C under a hydrogen and TBP ambient. After thermal cleaning, WZ InP NWs were grown for 15 min at 660°C with a V/III ratio of 18, which is t...