2008
DOI: 10.1002/pssc.200780128
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Pulse electrochemical method for porosification of silicon and preparation of porSi powder with controllable particles size distribution

Abstract: We have proposed to use a special electrochemical regime to introduce a preferable grain size into the entirely porosified Si material. This periodic pulse electrochemical regime permits layering of the entire porosified film and defines its preferable partition in the post anodization mechanical treatment. Thus, a preferable grain size is “hidden” in the grown porSi film and is revealed only under additional mechanical treatment like milling. The pore dimension and total porosity are controlled by applied cur… Show more

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Cited by 7 publications
(6 citation statements)
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“…MS-MPs were obtained by an electrochemical method similar to that previously described by us ( Pastor et al, 2009 ). The main difference was the use of a 1:1 HF:Ethanol electrolyte, and special cyclic regimes with etch-stops in order to improve the homogeneity of pore sizes distribution along with the in-depth etching ( Bychto et al, 2008 ). A constant current step (40 or 60 mA/cm 2 for 5–10 s) was followed by an etch-stop step (no current applied for 2–5 s) in cyclic periods.…”
Section: Methodsmentioning
confidence: 99%
“…MS-MPs were obtained by an electrochemical method similar to that previously described by us ( Pastor et al, 2009 ). The main difference was the use of a 1:1 HF:Ethanol electrolyte, and special cyclic regimes with etch-stops in order to improve the homogeneity of pore sizes distribution along with the in-depth etching ( Bychto et al, 2008 ). A constant current step (40 or 60 mA/cm 2 for 5–10 s) was followed by an etch-stop step (no current applied for 2–5 s) in cyclic periods.…”
Section: Methodsmentioning
confidence: 99%
“…This method is simple but has a dramatically low output. To meet the huge demand of nanostructured silicon, a growing number of research teams are active to find new strategies and develop high-output batch processing capable of producing nanostructured silicon powder in quantities allowing upscaling to industrial demands [ 16 - 18 ]. So far, a low-cost and scalable method of silicon nanowire production remains a major challenge.…”
Section: Introductionmentioning
confidence: 99%
“…Under (beneath) each surface cell a tubular layered structure appeared. As we proposed in [4] it could be the path by which the H 2 gas escaped from the grown porous film. The layered films obtained under the three pulse regime are extremely fragile.…”
Section: Experimental Results -Some Examples Of Primary Prototypes Obmentioning
confidence: 97%
“…Recently we have proposed and studied the new three pulses Regime IV [4]. It uses the advantages of an etch stop period combining them with incomplete lift-up.…”
Section: The Overview Of the Electrochemical Regimesmentioning
confidence: 99%
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