2011
DOI: 10.1002/pssa.201127537
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Pulsed laser deposition from a pre‐synthesized Cr2AlC MAX phase target with and without ion‐beam assistance

Abstract: Pulsed laser deposition (PLD) employing a pulsed Nd:YAG laser was used to grow thin films from a pre-synthesized Cr 2 AlC MAX phase ablation target onto MgO(100), amorphous SiO 2 and stainless steel substrates. The depositions were carried out for substrate temperatures from room temperature to 650 8C. For one set of samples, a 200 eV argon ion-beam was directed

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Cited by 14 publications
(8 citation statements)
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“…As stated by Eklund et al all these processes (CVD, sputtering, cathodic arc deposition have their own limitations that sets out the demand of other growth methods for not only Ti3AlC2 depositions but also various other MAX phase thin films [3,14]. However, we found only one report about the attempt to grow Cr2AlC MAX phase thin film by PLD, indicating vast compositional deviation from the Cr2AlC phase [32]. Therefore, we set out to examine the growth, properties and application-worthiness of thin films of a widely explored MAX phase Ti3AlC2 using PLD.…”
Section: Introductionmentioning
confidence: 70%
“…As stated by Eklund et al all these processes (CVD, sputtering, cathodic arc deposition have their own limitations that sets out the demand of other growth methods for not only Ti3AlC2 depositions but also various other MAX phase thin films [3,14]. However, we found only one report about the attempt to grow Cr2AlC MAX phase thin film by PLD, indicating vast compositional deviation from the Cr2AlC phase [32]. Therefore, we set out to examine the growth, properties and application-worthiness of thin films of a widely explored MAX phase Ti3AlC2 using PLD.…”
Section: Introductionmentioning
confidence: 70%
“…There have also been attempts to use pulsed laser deposition (PLD) and high power impulse magnetron sputtering (HiPIMS). PLD from Ti 3 SiC 2 [66] and Cr 2 AlC [67] compound targets resulted in a deviating thin film composition with no formation of MAX phase. HiPIMS, on the other hand, resulted in nanocrystalline MAX phase together with competing phases [68,69].…”
Section: Thin Film Synthesismentioning
confidence: 97%
“…A high‐power pulsed laser beam strikes a MAX phase single target in a high‐vacuum chamber, vaporizing the MAX phase and depositing it on a substrate kept at a low temperature (25°C‐800°C). PLD leads to high purities, but in the case of MAX phases, some carbides are typically detected between the nanometric MAX grains 141 . The ion‐beam has several interesting effects on film thickness and composition, concentration gradients within the films and on conductivity and hardness 141 .…”
Section: Synthesismentioning
confidence: 99%
“…PLD leads to high purities, but in the case of MAX phases, some carbides are typically detected between the nanometric MAX grains 141 . The ion‐beam has several interesting effects on film thickness and composition, concentration gradients within the films and on conductivity and hardness 141 . However so far, no clear model can be presented, but the high potential of PLD appeals for further investigations.…”
Section: Synthesismentioning
confidence: 99%