2018
DOI: 10.1063/1.5064736
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Pulsed-laser deposition of InSe thin films for the detection of thickness-dependent bandgap modification

Abstract: Layer-structured InSe is one of the intensively studied two-dimensional monochalcogenide semiconductors for optical and electrical devices. Significant features of the InSe device are the thickness dependent bandgap modification resulting in a peak shift of photoluminescence and a drastic variation of electron mobility. In this study, by applying the pulsed-laser deposition technique, we investigated the optical and electrical properties of c-axis oriented InSe films with the thickness varying from a few to hu… Show more

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Cited by 9 publications
(4 citation statements)
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“…also reported the InSe thin film deposited by the PLD method. [ 151 ] In this work, the thickness of InSe thin film shows a linear relationship to the duration of deposition with an empirical average growth rate of 6.1±0.2 nm min −1 , which indicates a precise control of thickness for the PLD method.…”
Section: Synthesis Strategiesmentioning
confidence: 62%
“…also reported the InSe thin film deposited by the PLD method. [ 151 ] In this work, the thickness of InSe thin film shows a linear relationship to the duration of deposition with an empirical average growth rate of 6.1±0.2 nm min −1 , which indicates a precise control of thickness for the PLD method.…”
Section: Synthesis Strategiesmentioning
confidence: 62%
“…On the other side, bottom-up methods can prepare InSe flakes for large-scale production. The bottom-up methods include pulsed laser deposition (PLD) [68][69][70], physical vapor deposition (PVD) [71], wet chemical methods [72], chemical vapor deposition (CVD) [73,74], and molecular beam epitaxy (MBE) [75].…”
Section: The Synthesis Of 2d Insementioning
confidence: 99%
“…Although the exfoliation methods have been widely used to investigate 2D III-VI semiconductors’ exceptional electrical properties, synthesizing large-area high-quality layered materials still requires bottom-up strategies, which are more suitable to be realized for industrial applications. To date, epitaxial growth by chemical vapor deposition (CVD), pulsed laser deposition (PLD), or molecular beam epitaxy (MBE) has been used for the synthesis of 2D III-VI metal chalcogenides [ 10 , 11 , 12 , 13 , 14 , 15 ]. However, the synthesis of single-phase indium selenide is still a challenge by chemical vapor deposition (CVD).…”
Section: Introductionmentioning
confidence: 99%