“…Thin films of the material are usually grown by radiofrequency magnetron sputtering, [2,13] although some other techniques, each having its own strong points, have also come into use. These techniques include mid-frequency dual magnetron sputtering, [11] bipolar pulsed magnetron sputtering, [14] direct current magnetron sputtering, [15] dual ion beam sputtering, [16] electron beam evaporation, [10] dual ion beam-assisted electron beam evaporation, [17] pulsed laser deposition, [18] atmospheric environment laser deposition, [19] rheotaxial growth and thermal oxidation, [20] spray pyrolysis, [6] ultrasonic spray pyrolysis, [5] sol-gel dip coating, [21] deposition from aqueous solutions, [22] and a variety of versions of CVD, viz., its atmospheric-pressure, [23] low-pressure, [24] ion beam-induced, [25] plasma-enhanced, [26] laser-induced, [27] photo-induced, [28] and atomic layer-controlled [29] variants. Recently, there has been considerable interest in epitaxial SnO 2 thin films.…”