2006
DOI: 10.1016/j.surfcoat.2004.11.007
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Pulsed magnetron sputtering of chromium boride films from loose powder targets

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Cited by 52 publications
(34 citation statements)
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“…They are generally deposited as thin films using magnetron sputtering with TiB 2 as the most widely studied diboride [1][2][3][4][5][6][7], but there are also reports on CrB 2 [8][9][10], ZrB 2 [11][12][13], HfB 2 [14,15], WB 2 [16], and TaB 2 [17]. MeB 2 films are almost exclusively sputtered from compound MeB 2 targets since a reactive process is undesirable considering the toxic nature and explosiveness of B-containing gases.…”
Section: Introductionmentioning
confidence: 99%
“…They are generally deposited as thin films using magnetron sputtering with TiB 2 as the most widely studied diboride [1][2][3][4][5][6][7], but there are also reports on CrB 2 [8][9][10], ZrB 2 [11][12][13], HfB 2 [14,15], WB 2 [16], and TaB 2 [17]. MeB 2 films are almost exclusively sputtered from compound MeB 2 targets since a reactive process is undesirable considering the toxic nature and explosiveness of B-containing gases.…”
Section: Introductionmentioning
confidence: 99%
“…A great interest is currently focused on the synthesis of metal-boron refractory compounds widely used for their unique properties, such as high melting point, hardness and superconductivity [1][2][3][4]. In view of their properties, it is of significant scientific and practical interest to study the possibility of obtaining metal-boron alloys as thin films.…”
Section: Introductionmentioning
confidence: 99%
“…However, these properties depend strongly on the deposition process and parameters [1][2][3][4][5][6][7][8][9][10][11][12][13][14]. To understand the relationships between these deposition parameters and the resulting properties requires detailed structural analysis of the films.…”
Section: Introductionmentioning
confidence: 99%
“…To understand the relationships between these deposition parameters and the resulting properties requires detailed structural analysis of the films. This understanding may give important information about the characteristics of the deposition processwhich in this particular case is a recently developed method involving magnetron sputtering of loosely packed powder (LPP) targets [1][2][3][4] -and then point to directions for improvement. The combination of a pulsed magnetron sputtering (PMS) process [5] with the use of blended powder targets is a new, highly flexible deposition tool, suitable for the development of novel physical vapour deposition (PVD) coating systems and the optimisation of film properties.…”
Section: Introductionmentioning
confidence: 99%