2009
DOI: 10.1063/1.3104857
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Pulsed metal-organic chemical vapor deposition of high-quality AlN/GaN superlattices for near-infrared intersubband transitions

Abstract: A pulsed metal-organic chemical vapor deposition technique is developed for the growth of high-quality AlN/GaN superlattices ͑SLs͒ with intersubband ͑ISB͒ transitions at optical communications wavelengths. Tunability of the AlN and GaN layers is demonstrated. Indium is shown to improve SL surface and structural quality. Capping thickness is shown to be crucial for ISB transition characteristics. Effects of barrier-and well-doping on the ISB absorption are reported.

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Cited by 29 publications
(17 citation statements)
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“…2,13 This offers a wider range of effective band-gap ͑optical emission͒ tunability of both interband transitions 14 and improved intersubband transitions. [15][16][17] In particular, earlier experimental results for using ͑Ga,Al͒N as a barrier have shown that the band gap is set primarily by the thickness of the well layer, 16 as well as by the barrier width. 5 However, a systematic investigation, particularly from the theoretical side, of the dependence of the band gap of GaN/AlN ͑0001͒ multiple quantum wells ͑MQWs͒ ͑with a few dozen periods͒, on the thickness of both well and barrier is still missing.…”
Section: Introductionmentioning
confidence: 99%
“…2,13 This offers a wider range of effective band-gap ͑optical emission͒ tunability of both interband transitions 14 and improved intersubband transitions. [15][16][17] In particular, earlier experimental results for using ͑Ga,Al͒N as a barrier have shown that the band gap is set primarily by the thickness of the well layer, 16 as well as by the barrier width. 5 However, a systematic investigation, particularly from the theoretical side, of the dependence of the band gap of GaN/AlN ͑0001͒ multiple quantum wells ͑MQWs͒ ͑with a few dozen periods͒, on the thickness of both well and barrier is still missing.…”
Section: Introductionmentioning
confidence: 99%
“…This is because MBE is, in general, a suitable technique to fabricate monolayer (ML)-controlled abrupt interfaces of AlN/GaN hetero-structures, which is one of the most important requirements for realizing ISBT at short wavelength region. However, the ISBT released by MOVPE showed much weaker and broader peak at around 1.55 mm wavelength compared with that achieved by MBE [12][13][14][15]. We have suggested that this is mainly attributed to the non-abrupt and non-uniform interfaces between wells and barriers due to the inter-diffusion by comparatively higher growth temperature of MQWs in MOVPE than that of MBE.…”
Section: Introductionmentioning
confidence: 47%
“…Furthermore, AlN/GaN MQWs also have merits such as high power handling capabilities and chemical and thermal robustness. Several research groups have reported nearinfrared-range ISBT in AlN/GaN MQWs [6][7][8][9][10][11][12][13][14][15]. Molecular beam epitaxy (MBE) and metal organic vapor phase epitaxy (MOVPE) have been mainly adopted to grow AlN/GaN MQWs.…”
Section: Introductionmentioning
confidence: 99%
“…This unique pulsing technique enabled us to achieve high optical and structural quality SLs characterized by atomic force microscopy, scanning electron microscopy, photoluminescence, and X-ray diffraction. 1 After this world's first demonstration of ISB at 1.5 µm 2,3 , we have developed the theory, and came up with a design for ISB absorption at 5.3 μm. Achieving ISB transitions in mid-infrared range required development high quality growth technique specifically designed targeting GaN/AlGaN superlattices.…”
Section: Introductionmentioning
confidence: 99%
“…One period consists of two main deposition phases: (1) AlN deposition, which is realized via pulsing TMAl and NH 3 to enhance aluminum adatom mobility (steps (I) and (II)), and (2) conventional GaN deposition (step (III)), which is realized by conventionally supplying TMGa and NH 3 simultaneously.…”
mentioning
confidence: 99%