Pump spot size dependent lasing threshold in organic semiconductor DFB lasers fabricated via nanograting transfer

Liu, Xin; Klinkhammer, Sönke; Wang, Ziyao; Wienhold, Tobias; Vannahme, Christoph; Jakobs, P.; Bacher, Andreas; Muslija, A.; Mappes, Timo; Lemmer, Uli

doi:10.1364/oe.21.027697

Cited by 18 publications

(19 citation statements)

References 31 publications

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“…The resulting devices are micro lasers, which are located at the desired position in the photonic chip (Figure 4a). This phenomena is well established theoretically as well as experimentally, [42,43] see also Supporting Information for an example. Figure 4c shows a zoom-in on one of these lasers.…”

Section: Perovskite Micro-laser Realizationsupporting

confidence: 65%

Micro Lasers by Scalable Lithography of Metal‐Halide Perovskites

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Brenner

Lemmer

et al. 2018

Adv Materials Technologies

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description of the efforts on developing perovskite lasers is given in recent review articles. [19][20][21][22] As the field advances, new approaches for patterning perovskite films are becoming essential. More specifically, a lithographic approach that can define desired perovskite patterns is highly needed in order to utilize these materials for the realization of integrated perovskite photonic devices. Generally speaking, effective lithographic patterning requires three main capabilities. First, the ability to cover the material (in our case perovskites) with a layer of resist and pattern it with sub-micrometer resolution using a scalable process. Second, employment of the patterned resist as an etch mask for complete removal of the unprotected perovskite film. Third, removal of the residual resist mask from the perovskite film. Since metal halide perovskites are unstable soluble materials that are sensitive to a variety of solvents and gases, [23] accomplishing all of the above steps without damaging the film is highly challenging. During the past few years, several attempts have been made in order to address this challenge. Lyashenko et al. [24] demonstrated the ability to pattern perovskites using photolithography followed by SF 6 etching. This approach was utilized to define patterns in photoresists on top of methyl-ammonium lead iodide (MAPbI 3 ) films but was limited to micrometer scale features due to diffraction effects in photolithography. In addition, the chemical reaction that was used in order to etch the material only modified the exposed areas chemically (converting the material to PbF 2 ) and did not remove the perovskite layer completely as desired from a proper etching technique. Zhang et al. [25] demonstrated a different approach where PMMA layers were deposited on top of a MAPbBr 3 film and patterned using electron beam lithography (EBL) followed by dry Cl etching. Although this method can potentially generate sub-micrometer features, it is based on a serial patterning technique (EBL) and is thus limited in terms of speed and cost. In addition, the scanning electron microscopy (SEM) images of the patterned surface suggest that the etching process left a residual layer on the surface (possibly PbCl 2 ) and was unable to remove the perovskite completely. A slightly different approach to pattern perovskite films, involving lift-off instead of etching, was recently successfully demonstrated. [26] However, this technique necessitates the evaporation of perovskite films and is not compatible with the standard spin-coating film preparation method which is simple, inexpensive, and renders these materials A complete lithographic scheme for thin metal halide perovskite films is demonstrated and utilized for the realization of perovskite micro lasers. The process consists of nanoimprint lithography followed by ion beam milling. It is simple, fast, scalable, and exhibits sub-micrometer resolution. The optical properties of the perovskite films are obtained by employing analytical tools as well as by cha...

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Section: Perovskite Micro-laser Realizationsupporting

confidence: 65%

Micro Lasers by Scalable Lithography of Metal‐Halide Perovskites

Bar‐On

Brenner

Lemmer

et al. 2018

Adv Materials Technologies

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“…There are a wide variety of metrics used to characterize lasers and laser materials and a complete overview of parameters is not only beyond our scope, but is also made problematic by the varied approaches to pumping these lasers. In the discussion of experimental implementation, we routinely quote the lasing threshold in terms of either pump irradiance or fluence (average pump energy divided by the pump beam area) at the onset of lasing . Also, we quote the lasing quantum slope efficiencies in terms of the steepest slope of the so‐called “J‐curve” of output power vs. pump power, as shown in Figure (a).…”

Section: Multilayer Cavity Dfb Design/theorymentioning

confidence: 99%

Melt‐processed polymer multilayer distributed feedback lasers: Progress and prospects

Andrews

Crescimanno

Singer

et al. 2013

J Polym Sci B Polym Phys

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Reflecting recent progress in the functionalization of roll-to-roll processed polymer multilayers, this review describes the development and characterization of versatile large-area multilayer distributed feedback (DFB) lasers. These developments are reviewed in the broader context of microresonator lasers, with a brief tutorial on the theory and experiment needed to understand their unique features. Of particular interest is the broad tunability of these DFB lasers by simple modification of their structure, mechanical stretching, and temperature. Prospects for commercialization of polymer multilayer DFB lasers are also discussed.

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“…[1][2][3][4][5][6][7] In particular, polymer lasers based on distributed feedback (DFB) cavities are promising because of their excellent mode confinement and high efficiency. [8][9][10][11][12][13] Integration of DFB polymer lasers can be achieved by cascading laser components or by employing complex structures such as DFB cavities. [14][15][16][17][18] For cascaded lasers, a 20-lm spacer layer usually inhibits optical coupling between different lasers.…”

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confidence: 99%

Multi-wavelength lasing in a beat structure

Zhai

Tong

et al. 2016

Applied Physics Letters

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Multi-wavelength polymer lasers are produced with one-dimensional beat structures fabricated with multiple gratings at the same substrate location using interference lithography. As a distributed feedback cavity, the beat structure is equivalent to a linear superposition of multiple grating cavities. Each emission wavelength is determined by the corresponding grating cavity, which implies that interaction between different cavities is very weak. For a beat structure consisting of three gratings, emission peaks at 558 nm, 565 nm, and 569 nm originate from 350-nm, 362-nm, and 374-nm cavities, with thresholds of 14.5 μJ/cm2, 15.0 μJ/cm2, and 13.5 μJ/cm2, respectively. This technique provides an alternative way to design compact polymer lasers.

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Pump spot size dependent lasing threshold in organic semiconductor DFB lasers fabricated via nanograting transfer

Cited by 18 publications

References 31 publications

Micro Lasers by Scalable Lithography of Metal‐Halide Perovskites

Micro Lasers by Scalable Lithography of Metal‐Halide Perovskites

Melt‐processed polymer multilayer distributed feedback lasers: Progress and prospects

Multi-wavelength lasing in a beat structure

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