2005
DOI: 10.1063/1.1927714
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Purification and crystallization of tungsten wires fabricated by focused-ion-beam-induced deposition

Abstract: International audienceWe studied the behavior of tungsten wires, fabricated by focused-ion-beam-induced deposition and subjected to high current density. We present a simple electrical treatment, which allows an improved wire resistivity of more than 80%. We have distinguished two steps in the treatment. When the current density reaches 1.4x107 A/cm2, Ga atoms segregate and form droplets on the wire. As the current density increases, new droplets appear and merge into a single droplet. At 5.8x107 A/cm2, the dr… Show more

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Cited by 27 publications
(29 citation statements)
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“…For comparison, bulk tungsten has a resistivity of 5 cm at room temperature. Resistivity values from about 100 cm to 300 cm have been reported for tungsten composites grown by FIB-induced deposition [18,23,24]. The variation in the resistivity of FIB-deposited materials is a consequence of the microstructure and composition difference due to the operating parameters, such as the ionbeam current, dose, substrate material, substrate temperature, scan speed and gas flux.…”
Section: Felling Of Freestanding Nanowires Grown On Sio 2 /Si Substramentioning
confidence: 99%
“…For comparison, bulk tungsten has a resistivity of 5 cm at room temperature. Resistivity values from about 100 cm to 300 cm have been reported for tungsten composites grown by FIB-induced deposition [18,23,24]. The variation in the resistivity of FIB-deposited materials is a consequence of the microstructure and composition difference due to the operating parameters, such as the ionbeam current, dose, substrate material, substrate temperature, scan speed and gas flux.…”
Section: Felling Of Freestanding Nanowires Grown On Sio 2 /Si Substramentioning
confidence: 99%
“…The high metal content along the full thickness explains the low resistivity of the deposits, typically ranging between 100 and 600 μΩ cm [ 43 -45 ], only 20 times higher than the bulk W resistivity, 5.6 μΩ cm. Post-annealing of these deposits by means of Joule heating was found to be effi cient to reduce a wire resistivity from 300 to 55 μΩ cm [ 46 ]. In addition to the aforementioned properties, W FIBID deposits show superconductivity below 5 K, as fi rst reported by Sadki et al [ 47 ].…”
Section: Introductionmentioning
confidence: 74%
“…The nanowire fabrication is performed using commercially available FIB machine (SMI 3050: SEIKO Instrument Inc.). The nanowire is deposited from tungsten hexacabonyl (W(CO) 6 ) and comprises 40% atomic concentration of W, 40% of C and 20% of Ga [17].…”
Section: Fabricationmentioning
confidence: 99%
“…FIB is also used to fabricate 3-dimensional nanostructures [3][4][5]. Efforts have been undertaken to investigate material properties of FIB induced nanostructures such as electrical resistivity [6], Young's modulus [7] and piezoresistivity [8]. More recently, FIB has found its usage to make electrical contact between dispersed nanowires on substrate and electrodes [9].…”
Section: Introductionmentioning
confidence: 99%