We demonstrate low-temperature high-density chip-stack interconnection using compliant bump. Low temperature chip stacking was carried out by two methods; (1) plasma cleaning of compliant bumps, (2) mechanical caulking using compliant bump and doughnut-shaped electrode. The latter method is very effective in realizing chip stacking even at room temperature.
IntroductionThree-dimensional (3D) chip-stacking technology is attracting a great deal of attention for advanced high-speed, compact, and highly functional electronic systems [1]- [7]. The 3D chip stack systems, especially the systems containing the array of circuit elements, such as array sensor, require highly reliable high-density area-bump interconnection technology because they have a large number (> 10,000) of I/0 connections. In solder bump technology, it is difficult to shrink the bump size and pitch. In the non-melting bonding of metal bumps, such as plated Au bumps, bump height deviation induces problems as it causes bonding failure and strain generation in LSI devices when in particular the bump pitch becomes small.To overcome these problems, we have proposed the compliant bump [8] [9], such as the pyramid bump and cone bump (Fig. 1).