2000
DOI: 10.1109/84.825786
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Quality factors in micron- and submicron-thick cantilevers

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Cited by 616 publications
(493 citation statements)
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“…Nevertheless since the ratio of the volume to surface area changed with the milling process, surface effects might play a larger role on the measured Q for these cantilevers. For example the cantilever Q might have decreased because the cantilevers' surface was contaminated or because the cantilever surface was oxidized by the formation of SiO 2 , similar to what other researchers have reported [22]. However, this alone cannot explain the decrease in Q observed here, which is much larger than that reported by other researchers for contamination and oxidation.…”
Section: Modified Cantilever Characteristics Before and After The Ioncontrasting
confidence: 56%
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“…Nevertheless since the ratio of the volume to surface area changed with the milling process, surface effects might play a larger role on the measured Q for these cantilevers. For example the cantilever Q might have decreased because the cantilevers' surface was contaminated or because the cantilever surface was oxidized by the formation of SiO 2 , similar to what other researchers have reported [22]. However, this alone cannot explain the decrease in Q observed here, which is much larger than that reported by other researchers for contamination and oxidation.…”
Section: Modified Cantilever Characteristics Before and After The Ioncontrasting
confidence: 56%
“…However, the scattered Ga+ ions still lead to radiation damage in the silicon, leading to a decrease in the Q, just as we have observed in our cantilevers. As the Q measurement is done in vacuum, the viscous drag due to the air is negligible in our experiments and only the internal stresses of the cantilever determine the quality factor Q [22]. Nevertheless since the ratio of the volume to surface area changed with the milling process, surface effects might play a larger role on the measured Q for these cantilevers.…”
Section: Modified Cantilever Characteristics Before and After The Ionmentioning
confidence: 97%
“…The thermal force has a white spectral density and a Gaussian distribution with zero mean. The spectral density of the thermal force for the nth mode is given by [20][21][22][23][24][25] …”
Section: B Thermal Noisementioning
confidence: 99%
“…The dissipation mechanisms include the viscous damping, the internal friction of the material, the clamping losses, and the thermoelastic dissipation. 21,22 However, for pressures higher than 1 mtorr, the dominant source of dissipation is the viscous damping. 21 Here, microcantilever arrays composed of 334-nm-thick silicon microcantilevers with various lengths and widths from 50 to 500 m and from 20 to 200 m, respectively, have been fabricated by using micromachining silicon technology.…”
Section: Introductionmentioning
confidence: 99%
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